Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts

A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1B) and a compound which is capable of generating an acid by irradiation of an actinic radiation;

• wherein said composition has an aromatic ring with conjugation length of 4 to 12, said aromatic ring is contained in a component copolymerized with said polymer, or said aromatic ring is contained in another compound separately added;
• wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, a halogen atom or a cyano group;
• R12 is an aliphatic hydrocarbon group or a cyclic olefin;
• R13 is either one of (a) a straight chain aliphatic group having 2 to 12 carbon atoms, a cyclic group selected from the group consisting of a cyclobutane ring, a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, a cyclooctane ring, a cyclobutane ring having a crosslinking hydrocarbon group, a cyclopentane ring having a crosslinking hydrocarbon group, a cyclohexane ring having a crosslinking hydrocarbon group, a cycloheptane ring having a crosslinking hydrocarbon group, a cyclooctane ring having a crosslinking hydrocarbon group, a spiro ring, a terpene ring, a steroid bile acid, a digitaloid ring, a camphor ring, an iso-camphor ring, a sesquiterpene ring, a santon ring, a diterpene ring, a triterpene ring and steroid saponins and (b) a hydrocarbon group represented by —(CH2)m (m is an integer of 3 to 9).

A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (4) and a compound which is capable of generating an acid by irradiation of an actinic radiation;

• wherein R41 is a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, a halogen atom or a cyano group;
• R42 and R43 may be the same or different and are individually an aliphatic hydrocarbon or a cyclic olefin;
• R44 is a group selected from the group consisting of cyclobutane ring, cyclooctane ring, a cyclobutane ring containing a crosslinking hydrocarbon group, a cyclooctane ring containing a crosslinking hydrocarbon group, spiro ring, terpene ring, steroid, bile acid, digitaloid ring, camphor ring, iso-camphor ring, sesquiterpene ring, santon ring, diterpene ring, triterpene ring and steroid saponins;
• and R45 is a hydrophilic group.

A method for forming a pattern, which comprises the steps of:

• coating a photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (4) and a compound which is capable of generating an acid by irradiation of an actinic radiation on a substrate, and drying the photosensitive composition with heating thereby forming a resin layer;
• exposing a predetermined area of said resin layer to a pattern exposure by means of light irradiation;
• performing a heat treatment of said resin layer after the pattern exposure;
• and
• developing said resin layer after the heat treatment by using a developer;
• wherein R41 is a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, a halogen atom or a cyano group;
• R42 and R43 may be the same or different and are individually an aliphatic hydrocarbon or a cyclic olefin;
• R44 is a group selected from the group consisting of cyclobutane ring, cyclooctane ring, a cyclobutane ring containing a crosslinking hydrocarbon group, a cyclooctane ring containing a crosslinking hydrocarbon group, spiro ring, terpene ring, steroid, bile acid, digitaloid ring, camphor ring, iso-camphor ring, sesquiterpene ring, santon ring, diterpene ring, triterpene ring and steroid saponins;
• and R45 is a hydrophilic group.

A method for manufacturing electronic parts, which comprises the steps of:

• coating a photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (4) and a compound which is capable of generating an acid by irradiation of an actinic radiation on a substrate thereby forming a resist film;
• exposing a predetermined area of said resist film to a pattern exposure by means of light irradiation;
• developing said resin film after the pattern exposure by using a developer thereby forming a resist pattern;
• and
• performing a patterning of the substrate by making use of the resist pattern as an etching mask;
• wherein R41 is a hydrogen atom, an aliphatic hydrocarbon group, an alkoxy group, a halogen atom or a cyano group;
• R42 and R43 may be the same or different and are individually an aliphatic hydrocarbon or a cyclic olefin;
• R44 is a group selected from the group consisting of cyclobutane ring, cyclooctane ring, a cyclobutane ring containing a crosslinking hydrocarbon group, a cyclooctane ring containing a crosslinking hydrocarbon group, spiro ring, terpene ring, steroid, bile acid, digitaloid ring, camphor ring, iso-camphor ring, sesquiterpene ring, santon ring, diterpene ring, triterpene ring and steroid saponins;
• and R45 is a hydrophilic group.