Back to results
US 6,280,886 B1Granted
Clean-enclosure window to protect photolithographic mask
AssigneeIntel Corporation
InventorPei-Yang Yan
Life of this patent
Estimating the term…
Abstract
A clean-enclosure to protect a reticle from contamination when using extreme ultraviolet (EUV) lithography is disclosed. The clean-enclosure consists of frame and a cover attached to the frame. The cover contains an exposure window comprised of a thin film of silicon. This thin film window allows EUV light to pass through to the reticle and reflect onto the photoresist layer of a semiconductor substrate with minimal transmission loss. Also, a process for forming the silicon thin film exposure window is disclosed.
Claims20
A photolithography system comprising:
- a first base resting on a second base;
- a reflective reticle mounted on the first base;
- a protective cover held a distance from the surface of the reflective reticle;
- and
- a window within the protective cover, the window comprising a material transmissive to a wavelength of photolithographic radiation.
2 more elements
A photolithography system comprising:
- a first base;
- a second base upon which the first base is disposed, wherein the second base is stationary and the first base is moveable laterally across the surface of the first base;
- a reticle mounted on the first base;
- a protective cover held at a distance from the reticle;
- and
- a window within the protective cover, the window comprising a material transmissive to an extreme ultraviolet light wavelength of photolithographic radiation.
3 more elements
Dependencies are inferred from the claim text.