Product produced by sequential ion implantation and deposition (SIID) technique
AssigneeUniversity of Maryland, Baltimore County
InventorsOleg Vesnovsky, Timmie Topoleski, Victor Pushnykh
Life of this patent
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Abstract
A surface of a substrate is vacuum coated with a material by sequentially implanting and depositing ions from a single ion source. First ions of the coating material are initially implanted into the surface of the substrate to form an implanted substrate layer. Next, second ions of the material are deposited on the implanted substrate layer to form a seed layer. Third ions of the material are then implanted into the seed layer to form an intermixed layer. Fourth ions of the material are deposited over the intermixed layer to form the coating over the substrate.
Claims1
A coated substrate comprising:
- a substrate formed of a first material selected from the group consisting of metals, polymers;
- and glass;
- an implanted substrate layer formed by implanting first ions into the substrate;
- a seed layer formed by depositing second ions on the implanted substrate layer;
- an intermix seed layer formed by implanting third ions into the seed layer;
- and
- a deposited coating formed by depositing fourth ions on the intennix seed layer, wherein a tansition between respective implanted and deposited layers is continuous, thereby reducing residual stresses in the coated substrate.
Dependencies are inferred from the claim text.