Stain resistant composition for polyamide containing substrates

A process for producing stain resistant polyamide products comprising the steps of:

• providing a polyamide substrate containing available dye sites;
• and
• contacting said polyamide substrate with an aqueous solution containing a composition which binds to said available dye sites, said composition including:
• i) a sulfonated novolak resin;
• ii) a magnesium salt;
• and
• iii) an addition polymer comprising
• a partially sulfonated and hydrolyzed styrene-maleic anhydride copolymer wherein from about 2 mole percent to about 20 mole percent of the styrene contained within salt styrene-maleic copolymer sulfonated.

A stain resistant polyamide product comprising:

• a polyamide substrate;
• and
• a stain blocking composition bound to available dye sites located on said polyamide substrate, said stain blocking composition comprising:
• i) a sulfonated novolak resin;
• and
• ii) an addition polymer comprising a styrene-maleic copolymer having the following repeat units:
• wherein from about 2 mole percent to about 20 mole percent of the styrene contained in said copolymer has been sulfonated;
• iii) a metal donor.