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US 6,280,517 B1Granted
Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method
AssigneeMatushita Electric Industrial Co., Ltd.
InventorKazufumi Ogawa
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Abstract
The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.
Claims8
A chemical adsorbent solution comprising a solution mixture containing an alkoxysilane surface active agent, an active hydrogen-free non-aqueous solvent and an organic silanol condensing catalyst.
Dependencies are inferred from the claim text.