Substrate feed control
AssigneeKokusai Electric Corporation
InventorYasushi Yoshida
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AssigneeKokusai Electric Corporation
InventorYasushi Yoshida
Estimating the term…
A substrate processing apparatus has a plurality of processing chamber groups including at least one processing chamber group of a plurality of processing chambers for identically processing substrates concurrently therein, and a substrate feeder for feeding substrates to each of the processing chamber groups. A value calculated by dividing times required to process substrates in the processing chambers and times required to feed substrates to the processing chambers, by the number of the processing chambers is set to a tact time, and substrates are loaded into the substrate processing apparatus at intervals of the tact time. A time equal to or greater than a time required for the substrate feeder to perform a feed job is established as a feed slot, and a plurality of feed slots are established in the tact time. Substrates are loaded into the substrate processing apparatus with the substrate feeder in timed relation to the feed slots.
A method of controlling the feeding of substrates in a substrate processing apparatus having a plurality of processing chamber groups including at least one processing chamber group of a plurality of processing chambers for identically processing substrates concurrently therein, and a single substrate feeder for feeding substrates to the processing chamber groups, the method comprising the steps of:
A method of controlling the feeding of substrates in a substrate processing apparatus having a plurality of processing chamber groups including at least one processing chamber group of a plurality of processing chambers for identically processing substrates concurrently therein, and a single substrate feeder for feeding substrates to the processing chamber groups, the method comprising the steps of:
Dependencies are inferred from the claim text.