Electron beam exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorMasato Muraki
Life of this patent
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Abstract
Blurring of an electron beam image produced by the Coulomb effect upon forming a pattern on a substrate by exposure using a multi-electron beam exposure apparatus is corrected. The electron beam exposure apparatus has an elementary electron optical system array for generating a plurality of electron beams in accordance with the pattern to be exposed, a reduction electron optical system for imaging the electron beams coming from the elementary electron optical system array, a deflector for deflecting the electron beams, and a focal point/astigmatism control circuit for correcting the imaging positions of the electron beams in units of settling positions of the electron beams on the basis of correction data corresponding to the pattern to be exposed.
Claims50
An electron beam exposure apparatus for forming a pattern on a substrate by exposure using a plurality of electron beams, comprising:
- an electron beam source for generating a plurality of electron beams in accordance with a pattern to be exposed;
- a reduction electron optical system for imaging the plurality of electron beams emitted by said electron beam source on the substrate;
- a scanning unit for scanning the plurality of electron beams on the substrate;
- and
- a correction unit for correcting imaging positions of the plurality of electron beams on the basis of correction data corresponding to a distribution of the plurality of electron beams.
An electron beam exposure method for forming a pattern on a substrate by exposure using a plurality of electron beams, comprising the steps of:
- imaging a plurality of electron beams, which are emitted by an electron beam source in accordance with a pattern to be exposed, via a reduction electron optical system, and scanning the plurality of electron beams on the substrate;
- and
- correcting imaging positions of the plurality of electron beams on the basis of correction data corresponding to a distribution of the plurality of electron beams in synchronism with the scan.
An electron beam exposure apparatus which forms a pattern on a substrate by exposure using a plurality of electron beams, comprising:
- an electron beam source which generates a plurality of electron beams in accordance with a pattern to be exposed;
- a reduction electron optical system which images the plurality of electron beams emitted by said electron beam source on the substrate;
- a scanning unit which scans the plurality of electron beams on the substrate;
- and
- a correction unit which corrects imaging positions of the plurality of electron beams on the basis of a distribution of the plurality of electron beams.
Dependencies are inferred from the claim text.