Method of treating skin related conditions

A method of treating a skin related condition selected from psoriasis, eczema, burns and dermatitis, in a subject, the method comprising administering to a subject having such condition, a therapeutically-effective amount of a compound of Formula I

• wherein Y is S;
• wherein X is one or more substituents selected from
• a) hydrido,
• halo,
• cyano,
• nitro,
• hydroxy,
• acyl,
• lower alkyl substituted with a substituent selected from halo, hydroxyl, amino, acylamino, lower alkylamino, lower alkyl(acyl)amino, acyl, aryl optionally substituted with hydroxyl, a heterocyclic group, hydroxyimino and lower alkoxyimino,
• lower alkenyl optionally substituted with cyano,
• amino optionally substituted with a radical selected from acyl and lower alkylsulfonyl,
• sulfo, sulfamoyl optionally substituted with a substituent selected from the group consisting of lower alkyl, halo-(lower) alkyl, aryl, hydroxyl, lower alkylamino(lower)alkyl, a heterocyclic group and (esterified carboxy)lower alkyl,
• N-containing heterocyclicsulfonyl,
• a heterocyclic group optionally substituted with a substituent selected from the group consisting of hydroxyl, oxo, amino and lower alkylamino,
• b) S(O)nR5, wherein r5 is C1-C6 alkyl optionally substituted with fluoro, and n is 0, 1 or 2,
• c) C(R5) (OR8) (R7), wherein R6 and R7 independently are selected from CF3, CF2H, CFCl2, CF2Cl, CClFH, CCl2F, CF3CF2 and C1-C2 alkyl, wherein R8 is selected from hydrido, C1-C4 alkyl, (C1-C3 alkyl)C(O) and CO2r9, and wherein R9 is C1-C4 alkyl,
• d) C(O)ZR4, wherein Z is O, N, or S, and R4 is selected from hydrido, C1-C6 alkyl and aryl, provided when Z is N then R4 is independently taken twice, and
• e) C(R9) (NHR11) (R10), wherein R9 and R10 are independently selected from CF3, CF2H, CFCl2, CF2Cl, CClFH and CCl2H, and R11 is selected from hydrido and C1-c3 alkyl;
• and
• wherein R2 and R3 are independently selected from aryl or heteroaryl, wherein the aryl or heteroaryl radical is optionally substituted with one or more radicals selected from halo, lower alkyl, lower alkoxy, lower akylthio, lower alkylsulfinyl, lower alkylsulfonyl, nitro, amide, amino, lower alkylamino, sulfamyl and lower alkylsulfonylamino;
• provided that R2 is 4-methylsulfonylphenyl or 4-sulfamylphenyl;
• or a pharmaceutically-acceptable salt thereof.