Raster scan gaussian beam writing strategy and method for pattern generation
AssigneeEtec Systems, Inc.
InventorsLee H. Veneklasen, William Devore
Life of this patent
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Abstract
A hybrid exposure strategy for pattern generation uses wide field raster scan deflection and a uniformly moving stage to expose long stripes. Periodic analog wide field magnetic scan is augmented by a high speed electrostatic retrograde scan to keep the beam essentially stationary during exposure of rectangular flash fields and/or Gaussian beams. In this manner a staircase deflection trajectory is created for the beam. The position and dose data for each flash is derived from a rasterized data format using a decoder device.
Claims9
A raster scan writing strategy for pattern generation on a substrate;
- said writing strategy comprising forming a Gaussian beam having a staircase deflection trajectory wherein said Gaussian beam is held essentially steady relative to said substrate during exposure of said substrate to said Gaussian beam.
A raster scan Gaussian beam writing strategy comprising:
- providing a substrate coupled to a moveable stage;
- providing a column, wherein said column forms a Gaussian beam;
- and
- exposing portions of said substrate with said Gaussian beam, wherein said Gaussian beam is directed across said substrate in a first direction by movement of said stage, and in a second direction by deflection within said column, said deflection and stage movement combining to create a staircase deflection trajectory for said Gaussian beam such that said Gaussian beam is held essentially steady relative to said substrate during said exposing portions of said substrate with said Gaussian beam.
Dependencies are inferred from the claim text.