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US 6,274,288 B1Granted
Self-trapping and self-focusing of optical beams in photopolymers
AssigneeCalifornia Institute of Technology
InventorsAnthony S. Kewitsch, Amnon Yariv
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Abstract
A polymer material is exposed to radiation of a type that changes some aspect of the polymer's radiation passing properties. The radiation that caused the property change is then contained by the material. The property change can be self-focusing or self-trapping light can be used. In that case, the same light that causes the photopolymerization is contained by the change in index of refraction that is caused by the polymerization.
Claims9
A method, comprising:
- selecting a polymer material exhibiting a nonlinear optical response upon application of a radiation beam thereto;
- applying the radiation beam to the material to change an index of refraction due to the nonlinear optical response in a path of said radiation beam in the material to form a radiation-guiding channel in the path with an index of refraction higher than a unexposed portion in the material;
- controlling an intensity and an exposure time of said radiation beam to produce a self-focusing effect in the material which reduces beam spreading caused by diffraction;
- directing a plurality of other radiation beams into the material to form a plurality of radiation-guiding channels based on said self-focusing effect, said radiation-guiding channels being separate from one another and said radiation-guiding channel;
- and
- forming corrugated periodic features on each radiation-guiding channel with one or more different spatial periods to encode data in each radiation-guiding channel.
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A method, comprising:
- depositing a polymer material over a photoresist layer formed on a substrate, the polymer material exhibiting a nonlinear optical response to a radiation beam;
- projecting a radiation pattern with the radiation beam on the polymer material to expose at least a portion of the polymer material;
- controlling the intensity of the radiation beam to change an index of refraction in a path of the radiation beam in the polymer material under the nonlinear optical response so that self focusing occurs to create a focus point at an interface between the polymer material and the photoresist layer with a focus spot size less than a feature size in the radiation pattern, wherein the index change creates a radiation-guiding channel in the path with an index of refraction higher than a unexposed portion in the material;
- and
- exposing the photoresist to radiation through one or more of radiation-guiding channels caused by self focusing to print the radiation pattern with a reduced feature size.
2 more elements
Dependencies are inferred from the claim text.