Method for cleaning semiconductor processing equipment by reducing particles
AssigneeAdvanced Micro Devices, Inc.
InventorsCesar R. Fernando, Narendra Patel
Life of this patent
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Abstract
A cleaning handle is used to clean semiconductor processing equipment to reduce particles. A relatively thin handle is formed for insertion into difficult to reach areas and, in one end, includes slots for affixing a cleaning wipe. A method for using the cleaning handle to clean semiconductor processing equipment includes affixing a cleaning wipe to the slots, wrapping the cleaning wipe around the end with the slots, and then wiping the semiconductor processing equipment with the cleaning handle. The cleaning wipe can be moistened with a cleaning agent, such as isopropyl alcohol, to improve its effectiveness.
Claims7
A method for cleaning a semiconductor processing device using a cleaning handle, the cleaning handle having a first end and a second end, the method comprising the steps of:
- affixing a cleaning wipe to the first end of the handle;
- wrapping the cleaning wipe around the first end of the handle;
- and
- wiping the semiconductor processing with the cleaning handle.
Dependencies are inferred from the claim text.