Substrate support for plasma processing
AssigneeApplied Materials, Inc.
InventorsShamouil Shamouilian, Ananda H. Kumar, Siamak Salimian, Mahmoud Dahimene, Michael G. Chafin, Dennis S. Grimard
Life of this patent
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Abstract
A support 55 comprises a dielectric 60 covering a primary electrode 70, the dielectric 60 having a surface 75 adapted to receive a substrate 25 and a conduit 160 that extends through the dielectric 60. The thickness of a portion of the dielectric 60 between an edge 195 of the primary electrode 70 and a surface 180 of the conduit 160 is sufficiently large to reduce the incidence of plasma formation in the conduit 160 when the primary electrode 70 is charged by an RF voltage to form a plasma of gas in the chamber 30 during processing of the substrate 25.
Claims26
A support capable of supporting a substrate and energizing a gas in a chamber, the support comprising:
- (a) an electrode that is chargeable to energize the gas in the chamber;
- and
- (b) a dielectric covering the electrode, the dielectric having a surface adapted to receive the substrate, and the dielectric having a conduit extending therethrough, a thickness of a portion of the dielectric between an edge of the electrode and a sidewall of the conduit being sufficiently large to reduce plasma formation in the conduit.
A support capable of supporting a substrate during processing in a chamber, the support comprising:
- means for receiving the substrate;
- means for providing a first gas below the substrate;
- means for energizing a second gas above the substrate;
- and
- means for reducing plasma formation in the means for providing a first gas below the substrate during processing of the substrate on the support in the chamber.
A support capable of supporting a substrate in a chamber, the support comprising:
- (a) a dielectric having a surface adapted to receive the substrate, the dielectric comprising a conduit;
- (b) a first electrode covered by the dielectric, the first electrode being chargeable to energize gas in the chamber, and the first electrode having an edge around the conduit;
- and
- (c) a second electrode covered by the dielectric.
Dependencies are inferred from the claim text.