Film forming apparatus
AssigneeCanon Kabushiki Kaisha
InventorsTakehito Yoshino, Hiroshi Echizen, Masahiro Kanai, Hirokazu Otoshi, Atsushi Yasuno, Kohei Yoshida, Koichiro Moriyama, Masatoshi Tanaka
Life of this patent
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Abstract
A film forming apparatus for forming a plurality of films on a substrate through a continuous process, comprising a plurality of vacuum chambers in communication to each other via connection, at least vacuum chamber having internally a treatment detachable from the vacuum chamber for fulfilling a predetermined treatment on the substrate.
Claims39
A film forming apparatus for forming a plurality of films on a substrate through a continuous process, comprising a plurality of vacuum chambers which are in communication with each other via a connection, at least one vacuum chamber having a treatment room detachable from said vacuum chamber for carrying out a treatment on said substrate, wherein said treatment room is housed in the vacuum chamber.
A film forming apparatus for forming a plurality of films on a substrate through a continuous process, comprising a plurality of vacuum chambers which are in communication to each other via a connection, at least one vacuum chamber internally having a treatment room for fulfilling a predetermined treatment on said substrate, and a mechanism for adjusting the position of said treatment room within said vacuum chamber in a horizontal plane.
A film forming apparatus for forming a plurality of films on a substrate through a continuous process, comprising a plurality of vacuum chambers which are in communication with each other via a connection, at least one vacuum chamber having a film forming chamber detachable from said vacuum chamber for carrying out film formation on said substrate, said film forming chamber having a waveguide passage for introducing electric power for forming the film into said film forming chamber on the side where the attaching or detaching operation is performed, and wherein one face of the vacuum chamber comprises a detachable flange and said film forming chamber has said waveguide passage on a face opposite to the flange, and said flange is provided with an applicator for introducing electric power into a waveguide, said applicator being connected detachably to said waveguide, and communicating said waveguide to the outside.
A film forming apparatus for forming a plurality of films on a substrate through a continuous process, comprising a plurality of vacuum chambers which are in communication with each other via a connection, at least one vacuum chamber having a treatment room detachable from said vacuum chamber and for carrying out a treatment on said substrate, a mechanism for continuously moving a band-like substrate into the treatment rooms within a plurality of vacuum chambers, whereby a plurality of films are continuously formed on said substrate within said treatment room, and wherein a gate valve is provided between adjacent chambers to provide a pressure difference between adjacent vacuum chambers, said gate valve comprising a support and a movable portion having a valve opposite said support at least at the top end thereof, wherein said valve in contact with said support can provide air tight isolation between a plurality of regions partitioned by a contact area.
Dependencies are inferred from the claim text.