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US 6,273,954 B1Granted
System for manufacturing a semiconductor device
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsKazuyasu Nishikawa, Shingo Tomohisa
Life of this patent
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Abstract
A gas supply system for supplying a gas into a reaction chamber is provided with a pulse valve, a mass flow controller and a back pressure controller. The mass flow controller includes a flow meter and a variable flow control valve, and the back pressure controller includes a pressure gauge and a pressure control valve. The pulse valve, the mass flow controller and the back pressure controller are connected to a controller so that operations thereof are controlled by this controller.
Claims11
A system for manufacturing a semiconductor device comprising:
- a reaction chamber;
- a gas supply system for supplying a gas into said reaction chamber;
- a gas flow controller provided on said gas supply system for controlling the flow rate of said gas supplied to said pulse valve;
- a back pressure controller provided on said gas supply system for controlling the back pressure of said pulse valve;
- and
- a control part for controlling the operations of at least one of said gas flow controller and said back pressure controller based upon a selection by said control part to control at least one of back pressure and gas flow based on a change of pressure in said reaction chamber and a change in flow rate of said gas.
3 more elements
Dependencies are inferred from the claim text.