Apparatus and method for trapping a toxic gas
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Chang Shih, Yung-Dar Chen, Fu-Shun Lo, Wen-Hsiung Wu
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Chang Shih, Yung-Dar Chen, Fu-Shun Lo, Wen-Hsiung Wu
Estimating the term…
An apparatus and a method for trapping a toxic gas contained in an exhaust gas from a process chamber are disclosed. In the apparatus, two toxic gas traps are provided which are connected in series with a toxic gas sensor provided thereinbetween and in fluid communication with the two traps. When toxic gas is detected by the toxic gas sensor, i.e., an indication that the first toxic gas trap is fully consumed, the second toxic gas trap is used to replace the first toxic gas trap, while a new toxic gas trap is installed as the second toxic gas trap. The present invention novel apparatus and method enables the full use or utilization of a toxic gas trap and results in significant cost savings. Furthermore, the present invention novel apparatus and method improves the yield of a fabrication process by reducing the machine down time since the service frequency for the chamber is reduced.
A method for trapping a toxic gas comprising the steps of:
An apparatus for trapping a toxic gas comprising:
An apparatus for trapping fluorine gas from an exhaust of a laser chamber comprising:
Dependencies are inferred from the claim text.