Staging apparatus and method, and method for manufacturing the staging apparatus, and exposing apparatus using the staging apparatus

A staging apparatus which performs position control of a stage by using an interferometer, comprising:

• a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer,
• a vibration suppressing device which suppresses a vibration which is generated as said stage moves;
• and
• a measuring device which measures information on a vibration which is generated by movement of said stage while said stage moves,
• wherein said vibration suppressing device has a first control mode in which said vibration is suppressed based on said drive information, and a second control mode in which said vibration is suppressed based on information from said measuring device, and said vibration suppressing device uses said second control mode selectively.

A method for manufacturing a staging apparatus which performs position control of a stage by using an interferometer, comprising:

• providing a base which supports said stage movably;
• connecting, to said base, a vibration suppressing device which suppresses a vibration generated in said base;
• connecting, to said stage, a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer;
• and
• connecting to said vibration suppressing device, a displacement measuring device which measures an amount relating to displacement of said base,
• wherein said vibration suppressing device has a first control mode in which said vibration is suppressed based on a predicted vibration of said base, and a second control mode in which said vibration is suppressed based on information from said displacement measuring device, and said vibration suppressing device uses said second control mode selectively.

A method for manufacturing a staging apparatus which performs position control of a stage by using an interferometer, comprising:

• connecting, to said interferometer, a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer;
• and
• connecting, to said driving device, a vibration suppressing device which suppresses a vibration which is generated as said stage moves, based on said drive information,
• wherein said vibration suppressing device includes a measuring device which measures information on a vibration which is generated by movement of said stage while said stage moves, and wherein said vibration suppressing device has a first control mode in which said vibration is suppressed based on said drive information, and a second control mode in which said vibration is suppressed based on information from said measuring device, and said vibration suppressing device uses said second control mode selectively.

A staging apparatus which performs position control of a stage by using an interferometer, comprising:

• a base which supports said stage movably;
• a vibration suppressing device which suppresses a vibration generated in said base;
• a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer;
• and
• a displacement measuring device which measures an amount relating to displacement of said base,
• wherein said vibration suppressing device has a first control mode in which said vibration is suppressed based on a predicted vibration of said base, and a second control mode in which said vibration is suppressed based on information from said displacement measuring device, and upon effecting the final positioning of said stage, said vibration suppressing device shifts from a first control state using both said first and second control modes to a second control state using only said second control mode.

An exposure apparatus that includes a staging apparatus which performs position control of a stage by using an interferometer, comprising:

• a base which supports said stage movably;
• a vibration suppressing device which suppresses a vibration generated in said base;
• a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer;
• and
• a displacement measuring device which measures an amount relating to displacement of said base,
• wherein said vibration suppressing device has a first control mode in which said vibration is suppressed based on a predicted vibration of said base, and a second control mode in which said vibration is suppressed based on information from said displacement measuring device, and upon effecting the final positioning of said stage, said vibration suppressing device shifts from a first control state using both said first and second control modes to a second control state using only said second control mode.

A method for manufacturing a staging apparatus which performs position control of a stage by using an interferometer, comprising:

• providing a base which supports said stage movably;
• connecting, to said base, a vibration suppressing device which suppresses a vibration generated in said base;
• connecting, to said stage, a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer;
• and
• connecting, to said vibration suppressing device, a displacement measuring device which measures an amount relating to displacement of said base,
• wherein said vibration suppressing device has a first control mode in which said vibration is suppressed based on a predicted vibration of said base, and a second control mode in which said vibration is suppressed based on information from said displacement measuring device, and upon effecting the final positioning of said stage, said vibration suppressing device shifts from a first control state using both said first and second control modes to a second control state using only said second control mode.

An exposure apparatus which forms a pattern on a substrate, including a staging apparatus which performs position control of a stage for said substrate by using an interferometer, comprising:

• a base which supports said stage movably;
• a vibration suppressing device which suppresses a vibration generated in said base;
• a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer;
• and
• a displacement measuring device which measures an amount relating to displacement of said base,
• wherein said vibration suppressing device has a first control mode in which said vibration suppressing device is controlled based on a predicted vibration of said base, and a second control mode in which said vibration suppressing device is controlled based on information from said displacement measuring device, and said vibration suppressing device uses said second mode selectively.

An exposure apparatus which forms a pattern on a substrate, including a staging apparatus which performs position control of a stage for said substrate by using an interferometer, comprising:

• a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer,
• a vibration suppressing device which suppresses a vibration which is generated as said stage moves, based on said drive information;
• and
• a measuring device which measures information on a vibration which is generated by movement of said stage while said stage moves,
• wherein said vibration suppressing device has a first control mode in which said vibration is suppressed based on said drive information, and a second control mode in which said vibration is controlled based on information from said measuring device, and said vibration suppressing device uses said second control mode selectively.

A method for manufacturing an exposure apparatus which forms a pattern on a substrate, said method including manufacturing a staging apparatus which performs position control of a stage for said substrate by using an interferometer, comprising:

• providing a base which supports said stage movably;
• connecting, to said base, a vibration suppressing device which suppresses a vibration generated in said base;
• connecting, to said stage, a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer;
• and
• connecting to said vibration suppressing device, a displacement measuring device which measures an amount relating to displacement of said base,
• wherein said vibration suppressing device has a first control mode in which said vibration suppressing device is controlled based on a predicted vibration of said base, and a second control mode in which said vibration suppressing device is controlled based on information from said displacement measuring device, and said vibration suppressing device uses said second control mode selectively.

A method for manufacturing an exposure apparatus which forms a pattern on a substrate, said method including manufacturing a staging apparatus which performs position control of a stage for said substrate by using an interferometer, comprising:

• connecting, to said interferometer, a driving device which drives said stage, based on predetermined drive information on said position control, and position information of said stage obtained by said interferometer;
• and
• connecting, to said driving device, a vibration suppressing device which suppresses a vibration which is generated as said stage moves, based on said drive information,
• wherein said vibration suppressing device includes a measuring device which measures information on a vibration which is generated by movement of said stage while said stage moves, and wherein said vibration suppressing device has a first control mode in which said vibration is suppressed based on said drive information, and a second control mode in which said vibration is controlled based on information from said measuring device, and said vibration suppressing device uses said second control mode selectively.