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AssigneeHitachi, Ltd.
InventorsTomio Iwasaki, Hideo Miura
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A semiconductor memory includes a structure in which an insulating film is formed on a transistor constituted by a gate oxide film, a gate electrode and diffusion regions, an information storage capacitance device is formed on the insulating film and is connected to the diffusion layer through a polycrystalline silicon film. The capacitance device includes a bottom electrode formed by laminating an electrically conductive film and a precious metal film, an oxide film and a top electrode. The precious metal film contains an additional element having a smaller atomic radius than that of a precious metal element as a main constituent element besides the precious metal element, and interatomic bond energy between this additional element and the precious metal element is within ±20 % of interatomic bond energy between the precious metal elements. This structure can restrict the grain boundary diffusion of oxygen in the precious metal film as well as oxidation of the electrically conductive film, can prevent delamination between the conductive film and the precious metal film, and can prevent conduction failures.
A semiconductor memory having a structure in which an information storage capacitance device comprising a ferroelectric film or an oxide film having a high dielectric constant, formed on a bottom electrode including at least one layer of a precious metal layer, in such a manner as to keep contact with said bottom electrode, and a top electrode formed on said ferroelectric film or on said oxide film, is electrically connected to a silicon (Si) substrate either directly or through an electrically conductive film, wherein said precious metal layer is a single layer and includes at least one kind of additional elements, wherein said at least one kind of said additional elements is an element having a smaller atomic radius than the atomic radius of said precious metal element, and wherein an interatomic bond energy between said element and said precious metal element is within ±20% of interatomic bond energy between said precious metal elements.
A semiconductor memory having a structure in which an information storage capacitance device comprising a ferroelectric film or an oxide film having a high dielectric constant, formed on a bottom electrode including at least a first layer of a precious metal layer and a second layer of a conductive film, in such a manner as to keep contact with said bottom electrode, and a top electrode formed on said ferroelectric film or on said oxide film, is electrically connected to a silicon (Si) substrate either directly or through an electrically conductive film, wherein said precious metal layer is a single layer and includes at least one kind of additional elements, wherein said at least one kind of said additional elements is an element having a smaller atomic radius than the atomic radius of said precious metal element, and wherein an interatomic bond energy between said element and said precious metal element is within ±20% of interatomic bond energy between said precious metal elements to prevent delamination of the precious metal layer from the second layer of a conductive film by restricting grain boundary diffusion in the precious metal layer.
A semiconductor memory having a structure in which an information storage capacitance device comprising a ferroelectric film or an oxide film having a high dielectric constant, formed on a bottom electrode including at least one layer of a precious metal layer and a second layer of a conductive film, in such a manner as to keep contact with said bottom electrode, and a top electrode formed on said ferroelectric film or on said oxide film, is electrically connected to a silicon (Si) substrate either directly or through an electrically conductive film, wherein said precious metal layer is a single layer, and means for restricting grain boundary diffusion in said precious metal layer to prevent delamination of the precious metal layer from the second layer of a conductive film, said restricting means including at least one kind of additional elements being included in said precious metal layer, wherein said at least one kind of said additional elements is an element having a smaller atomic radius than the atomic radius of said precious metal element, and wherein an interatomic bond energy between said element and said precious metal element is within ±20% of interatomic bond energy between said precious metal elements.
Dependencies are inferred from the claim text.