Apparatus for vaporizing liquid raw material and method of cleaning CVD apparatus

A method of cleaning a CVD apparatus having a vaporizer for vaporizing a liquid raw material by applying heat and a processing chamber for forming a thin film on a substrate by a CVD method by using the raw material vaporized by said vaporizer, comprising the steps of:

• introducing a cleaning solution comprising components for dissolving residues generated in said vaporizer and said processing chamber into said vaporizer in such a manner that the cleaning solution is in a vaporized state so as to remove residues in said vaporizer;
• and
• introducing an exhaust gas containing the components of the cleaning solution supplied from said vaporizer into said processing chamber so as to remove residues in said processing chamber.

A method of cleaning a CVD apparatus incorporating an apparatus for vaporizing a liquid raw material and a processing chamber for forming a thin film on a substrate by a CVD method by using the raw material vaporized in said vaporizing apparatus, said method comprising the steps of:

• introducing an exhaust gas generated after residues in said vaporizing container have been removed by using the plasma while the inside portion of said processing chamber is vacuum-exhausted;
• and
• generating plasma in said processing chamber by using the exhaust gas so that residues in said processing chamber are removed simultaneously with performing removal of residues in said vaporizing container.