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US 6,271,412 B1Granted
Photosensitive monomer
AssigneeEverlight USA, Inc.
InventorsShang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin
Life of this patent
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Abstract
This invention provides a compound of the formula (I): wherein R is hydrogen or C1-C4 alkyl group; R′ is C1-C4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. The compound of formula (I) can be polymerized or copolymerized to form a photosensitive polymer or copolymer.
Claims9
A compound of the formula (I),
- wherein:
- R is hydrogen or C1-C4 alkyl group;
- R′ is C1-C4 alkyl group;
- n is an integer of 2, 3, 4, 5 or 6.
1 more element
Dependencies are inferred from the claim text.