Loading patent…
AssigneeLG Electronics Inc.
InventorsByung-Gil Ryu, Myeong-Soo Chang
Estimating the term…
A composition for barrier ribs of plasma display panels and to a method of fabricating such barrier ribs using the composition is disclosed. The composition for the barrier ribs is SiO2—ZnO—PbO—B2O3 based glass. The SiO2—ZnO—PbO—B2O3 based glass consists of 10˜20 wt % of SiO2, 10˜30 wt % of ZnO, 5˜30 wt % of PbO, 10˜30 wt % of B2O3, 2˜10 wt % of K2O, 0˜5 wt % of Li2O, 1˜5 wt % of CaO, 3˜8 wt % of Na2O, 1˜5 wt % of Al2O3, and 0˜2 wt % of Sb2O3. In the method of forming the barrier ribs, the SiO2—ZnO—PbO—B2O3 based glass powder free from an oxide filler is primarily prepared. Paste or slurry is formed by mixing the SiO2—ZnO—PbO—B2O3 based glass with an organic vehicle. A thick film, having a predetermined thickness, is formed on the top surface of a lower substrate using the paste or slurry. Desired barrier ribs are, thereafter, formed by processing the paste or slurry film. In the barrier rib formation step, a pattern is formed on the top surface of the paste or slurry film before the paste or slurry film is etched or abraded using the pattern as a mask. The barrier ribs may be formed by stamping the paste or slurry film using a mold having a shape opposed to the desired pattern of the barrier ribs. The barrier ribs may be also formed by patterning a photoresist paste or slurry film.
A composition for barrier ribs of a plasma display panel, comprising a SiO2—ZnO—PbO—B2O3 based glass wherein said SiO2—ZnO—PbO—B2O3 based glass comprises 10-20 wt % of SiO2, 10-30 wt % of ZnO, 5-30 wt % PbO, 10-30 wt % of B2O3, 2-10 wt % of K2O, 0-5 wt % of Li2O, 1-5 wt % CaO, 3-8 wt % of Na2O, 1-5 wt % of Al2O3, and Sb2O3 in an amount not greater than 2 wt %.
Dependencies are inferred from the claim text.