Electron beam treatment of fluorinated silicate glass
AssigneeElectron Vision Corporation
InventorMatthew F. Ross
Life of this patent
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Abstract
The invention pertains to dielectric films for the production of microelectronic devices. A relatively stabile fluorinated silicate glass film is produced by depositing a fluorinated silicate glass film onto a substrate and then exposing the fluorinated silicate glass film to electron beam radiation. The electron beam exposing step is conducted by overall exposing the dielectric layer with a wide, large beam of electron beam radiation from a large-area electron beam source.
Claims23
A process for producing a fluorinated silicate film which comprises depositing a fluorinated silicate film onto a substrate and then exposing the fluorinated silicate film to electron beam radiation.
A process for stabilizing fluorinated silicate film which comprises exposing a fluorinated silicate film to electron beam radiation under conditions sufficient to stabilize the fluorinated silicate film compared to the fluorinated silicate film prior to such exposure.
A microelectronic device which comprises a substrate, and a fluorinated silicate film on the substrate, which fluorinated silicate film has been exposed to electron beam radiation under conditions sufficient to stabilize the fluorinated silicate film compared to the fluorinated silicate film prior to such exposure.
A process for producing a microelectronic device which comprises:
- (a) applying a fluorinated silicate film onto a substrate;
- (b) exposing the fluorinated silicate film to electron beam irradiation under conditions sufficient to stabilize the fluorinated silicate film compared to the fluorinated silicate film prior to such exposure;
- (c) imagewise patterning the fluorinated silicate film to form vias in the film extending to the substrate;
- (d) optionally patterning the fluorinated silicate film to form trenches in the film;
- (e) depositing a metal into the vias, the optional trenches, and onto a top surface of the fluorinated silicate film;
- (f) removing the metal from the top surface of the fluorinated silicate layer.
Dependencies are inferred from the claim text.