Non-lithographic process for producing nanoscale features on a substrate
AssigneeLuna Innovations Incorporated
InventorMichael B. Miller
Life of this patent
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Abstract
A non-lithographic process for producing nanoscale features on a substrate is presented. The process involves applying to and reacting a first difunctional molecule with the surface of a substrate. A second difunctional molecule is applied and reacted with unreacted functional groups from the first difunctional molecule to form a patterned layer on the surface of a substrate. Selective application of the difunctional molecules is accomplished by using a nanoscale delivery device.
Claims42
A process for producing nanoscale features on a substrate, the process comprising the steps of:
- a) providing a first difunctional molecule and a substrate having a surface wherein the first difunctional molecule has a functional group capable of reacting with the surface of the substrate;
- b) applying the first difunctional molecule to the surface of the substrate and allowing the functional group to react with the surface of the substrate;
- c) providing a second difunctional molecule wherein the second difunctional molecule has a functional group capable of reacting with an unreacted functional group of the first difunctional molecule;
- d) selectively applying the second difunctional molecule on top of the first difunctional molecule using a nanoscale delivery device;
- and
- e) allowing the second difunctional molecule to react with the unreacted functional group of the first difunctional molecule to form a patterned layer on the surface of the substrate.
A process for producing nanoscale features on a substrate, the process comprising the steps of:
- a) providing a first difunctional molecule and a substrate having a surface wherein the first difunctional molecule has a functional group capable of reacting with the surface of the substrate;
- b) applying the first difunctional molecule to the surface of the substrate and allowing the functional group of the first difunctional molecule to react with the surface of the substrate;
- c) providing a second difunctional molecule wherein the second difunctional molecule has a functional group capable of reacting with an unreacted functional group of the first difunctional molecule;
- d) applying the second difunctional molecule on top of the first difunctional molecule;
- e) selectively reacting the first difunctional molecule with the second difunctional molecule;
- and
- f) washing the substrate to remove any unreacted second difunctional molecule and leaving a patterned layer on the surface of the substrate.
A process for producing nanoscale features on a substrate, the process comprising the steps of:
- a) providing a first difunctional molecule and a substrate having a surface wherein first difunctional molecule has a functional group capable of reacting with the surface of the substrate;
- b) applying the first difunctional molecule to the surface of the substrate using a nanoscale delivery device and allowing the functional group of the first difunctional molecule to react with the surface of the substrate;
- c) providing a second difunctional molecule wherein the second difunctional molecule has a functional group capable of reacting with an unreacted functional group of the first difunctional molecule;
- d) applying the second difunctional molecule on top of the first difunctional molecule;
- e) allowing the first difunctional molecule and the second difunctional molecule to react to form a patterned layer;
- and
- f) washing the substrate to remove the unreacted second difunctional molecule.
A substrate having multiple layers built on nanoscale features prepared by the process according to 9.
A substrate having multiple layers built on nanoscale features prepared by the process according to 23.
Dependencies are inferred from the claim text.