US 6,270,618 B1 · Plasma processing apparatus

Abstract

A plasma processing apparatus is provided which does not require replacement of a band eliminator according to a frequency used, which is capable of performing chamber cleaning without replacing a resonance circuit, and which is capable of performing plasma cleaning of the inside of the chamber without using a bellows. The plasma processing apparatus includes a resonance circuit (band eliminator) for causing series resonance with a microwave circuit formed of at least a susceptor electrode and a processing chamber in order to trap plasma between a plasma excitation electrode and the susceptor electrode when the surface of a workpiece placed on the susceptor electrode is processed by plasma generated between the plasma excitation electrode and the susceptor electrode, which are provided inside the processing chamber; and for causing parallel resonance with the microwave circuit in order to diffuse plasma inside the processing chamber when performing plasma cleaning.

Claims10

Dependent claims

A plasma processing apparatus, comprising:

a plasma excitation electrode provided inside a processing chamber;
a susceptor electrode provided inside the processing chamber;
and
a resonance circuit comprising a variable capacitor and a coil which are connected in series between end portions, said end portions of said resonance circuit being connected to said susceptor electrode and said processing chamber, respectively, wherein said resonance circuit is configured to cause series resonance with a first circuit formed of at least said susceptor electrode and said processing chamber by adjusting said variable capacitor to trap plasma between said plasma excitation electrode and said susceptor electrode when a surface of a workpiece placed on said susceptor electrode is processed by plasma generated between said plasma excitation electrode and said susceptor electrode and causes parallel resonance with said first circuit by adjusting said variable capacitor in order to diffuse plasma inside said processing chamber when performing plasma cleaning.

1 more element

A plasma processing apparatus, comprising:

a plasma excitation electrode provided inside a processing chamber;
a susceptor electrode provided inside the processing chamber;
and
a pair of resonance circuits each comprising a variable capacitor and a coil which are connected in series between end portions connected to said susceptor electrode and said processing chamber, respectively, said resonance circuits being connected to said susceptor electrode and said processing chamber at symmetrical positions, wherein said resonance circuits are configured to cause series resonance with a first circuit formed of at least said susceptor electrode and said processing chamber wherein said series resonance are attained by adjusting said variable capacitor to trap plasma between said plasma excitation electrode and said susceptor electrode when the surface of a workpiece placed on said susceptor electrode is processed by plasma generated between said plasma excitation electrode and said susceptor electrode and causes parallel resonance with said first circuit by adjusting said variable capacitor to diffuse plasma inside said processing chamber when performing plasma cleaning.

1 more element

Dependencies are inferred from the claim text.

Plasma processing apparatus

Life of this patent

Plasma processing apparatus

Life of this patent

Abstract

Claims10