# US 6,267,074 B1 · Plasma treatment systems > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 6,267,074 B1 - Document ID: US6267074B1 - Status: Granted - Kind: B1 - Application number: 09/028,898 - Filed: 1998-02-24 - Granted: 2001-07-31 - Earliest claimed: 1997-02-24 - Assignees: FOI Corporation - Inventors: Yutaka Okumura - Web page: https://patentgrep.com/patent/US6267074B1 ## CPC - H01J 37/32009: {Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources (plasma generation in general H05H1/24)} - C23C 16/5096: {Flat-bed apparatus} - C23C 16/52: Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} - H01J 37/32357: {Generation remote from the workpiece, e.g. down-stream} - H01J 37/32532: {Electrodes} - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A plasma treatment system comprises a plasma treatment section in which a plasma treatment space is formed and a plasma producing section in which plasma producing spaces are formed, the plasma producing section being affixed to or formed as a single piece with the plasma treatment section, wherein the plasma producing spaces are located adjacent to and connected to the plasma treatment space and are formed in a dispersed or otherwise distributed fashion. The system is associated with a magnetic circuit for confining electrons within the plasma producing spaces. The system has good controllability over the ratio of plasma constituents. Furthermore, the plasma treatment space is surrounded by a movable wall member to also enhance pressure controllability. ## Claims ### Claim 1 A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or otherwise distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and further wherein the sectional area of a region connected to or opening to said plasma treatment space is smaller than the sectional area of said plasma producing spaces. ### Claim 2 A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and said plasma producing spaces are associated with a magnetic circuit, magnetic elements for creating the magnetic circuit being disposed in a region surrounded or sandwiched by said plasma producing spaces, wherein the sectional area of a region connected to or opening to said plasma treatment space is smaller than the sectional area of said plasma producing spaces. ### Claim 3 A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or otherwise distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and said plasma producing spaces are associated with a magnetic circuit for confining electrons, and further wherein the sectional area of a region connected to or opening to said plasma treatment space is smaller than the sectional area of said plasma producing spaces. ### Claim 4 A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, further comprising: a movable wall member configured to be able to cover an opening part of said plasma treatment space defined with reference to said pair of parallel plates; a wall member drive mechanism for moving said movable wall member all the way between a first position where said movable wall member covers the opening part and a second position where said movable wall member uncovers the opening part; and a closed chamber including therein said movable wall member and said pair of parallel plates; wherein one of said pair of parallel plates is installed on an internal bottom surface of said chamber and has a top surface shaped to allow a substrate to be located thereon. ### Claim 5 (depends on 4) A plasma treatment system as defined in claim 4, further wherein the shape of said movable wall member is such that a gap serving as a throttle acting on a fluid flow is created between said movable wall member and said one of the parallel plates installed on the internal bottom surface of said chamber when said movable wall member is in the first position. ### Claim 6 (depends on 4) A plasma treatment system as defined in claim 4 provided with pressure control means for controlling the amount of movement of said movable wall member caused by said wall member drive mechanism in accordance with the pressure within said plasma treatment space. ### Claim 7 A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space formed in a dispersed or distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and said plasma producing spaces are associated with a magnetic circuit, magnetic elements for creating the magnetic circuit being disposed in a region surrounded or sandwiched by said plasma producing spaces, further comprising: a movable wall member configured to be able to cover an opening part of said plasma treatment space defined with reference to said pair of parallel plates; a wall member drive mechanism for moving said movable wall member all the way between a first position where said movable wall member covers the opening part and a second position where said movable wall member uncovers the opening part; and a closed chamber including therein said movable wall member and said pair of parallel plates; wherein one of said pair of parallel plates is installed on an internal bottom surface of said chamber and has a top surface shaped to allow a substrate to be located thereon. ### Claim 8 (depends on 7) A plasma treatment system as defined in claim 7, further wherein the shape of said movable wall member is such that a gap serving as a throttle acting on a fluid flow is created between said movable wall member and said one of the parallel plates installed on the internal bottom surface of said chamber when said movable wall member is in the first position. ### Claim 9 (depends on 7) A plasma treatment system as defined in claim 7 provided with pressure control means for controlling the amount of movement of said movable wall member caused by said wall member drive mechanism in accordance with the pressure within said plasma treatment space. ### Claim 10 A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and said plasma producing spaces are associated with a magnetic circuit for confining electrons, further comprising: a movable wall member configured to be able to cover an opening part of said plasma treatment space defined with reference to said pair of parallel plates; a wall member drive mechanism for moving said movable wall member all the way between a first position where said movable wall member covers the opening part and a second position where said movable wall member uncovers the opening part; and a closed chamber including therein said movable wall member and said pair of parallel plates; wherein one of said pair of parallel plates is installed on an internal bottom surface of said chamber and has a top surface shaped to allow a substrate to be located thereon. ### Claim 11 (depends on 10) A plasma treatment system as defined in claim 10, further wherein the shape of said movable wall member is such that a gap serving as a throttle acting on a fluid flow is created between said movable wall member and said one of the parallel plates installed on the internal bottom surface of said chamber when said movable wall member is in the first position. ### Claim 12 (depends on 10) A plasma treatment system as defined in claim 10 provided with pressure control means for controlling the amount of movement of said movable wall member caused by said wall member drive mechanism in accordance with the pressure within said plasma treatment space. ### Claim 13 A plasma treatment system, comprising: a plasma treatment section in which a plasma treatment space is formed; a plasma producing section in which plasma producing spaces are formed, wherein said plasma producing section is affixed to or formed as a single piece with said plasma treatment section and said plasma producing spaces are formed as concentric annular grooves each connected to said plasma treatment space; a first gas intake channel configured to introduce a plasma producing gas into said plasma producing spaces; and a second gas intake channel configured to introduce a treatment gas into said plasma treatment space. ### Claim 14 (depends on 13) The plasma treatment system as defined in claim 13, wherein the cross-sectional area of said plasma producing spaces taken along an adjoining surface between said plasma producing spaces and said plasma treatment space is made smaller than the cross-sectional area of said plasma treatment space taken along said adjoining surface. ### Claim 15 (depends on 13) The plasma treatment system as defined in claim 13 provided with a first field application circuit for applying an electric field or a magnetic field which contributes to the production or enhancement of plasma to said plasma treatment space and a second field application circuit for applying an electric field or a magnetic field which contributes to the production and enhancement of plasma to said plasma producing spaces. ### Claim 16 (depends on 15) The plasma treatment system as defined in claim 15 wherein the output power of said first field application circuit and that of said second field application circuit are independently controllable of each other. ### Claim 17 (depends on 13) The plasma treatment system as defined in claim 13 wherein the sectional area of a region connected to or opening to said plasma treatment space is smaller than the sectional area of said plasma producing spaces. ### Claim 18 (depends on 13) The plasma treatment system as defined in claim 13 wherein only a gas containing a reactive gas constituent is supplied to said second gas intake channel whereas a gas containing a non-reactive gas constituent is supplied to said first gas intake channel. ### Claim 19 (depends on 13) The plasma treatment system as defined in claim 13 wherein said plasma treatment system is a deposition treatment system/etching treatment system.