Method for manufacturing a device, an exposure apparatus, and a method for manufacturing an exposure apparatus
AssigneeNikon Corporation
InventorsNorio Murayama, Hideki Komatsuda
Life of this patent
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Abstract
An exposure apparatus comprises an X-ray source (2-3, 100, 101), an illumination system (4-7) for guiding said X-ray from an X-ray source to a mask (8), a projection system (9) for projecting a pattern on said mask by guiding said X-ray to an exposed plane (10) through a mask, wherein a projection system comprises a plurality of mirrors (91-94), and at least one reflection mirror (91) is interchangeable with a reflection mirror (97) having a different surface shape.
Claims20
A method for manufacturing an exposure apparatus which transcribes an image of a projection master on a substrate by a projection system having a plurality of reflection mirrors, comprising the steps of:
- a) measuring an image property of said projection system having said plurality of reflection mirrors;
- b) selecting from said image property an image property component to be adjusted;
- c) selecting at least one of said reflection mirrors which can adjust said image property component;
- d) calculating a surface shape of reflection mirror which can adjust substantially said image property component based on image property measurement results from step a);
- e) giving said reflection mirror selected in step c) the surface shape as calculated in step d);
- f) embedding said reflection mirror having said surface shape into said projection system.
An exposure apparatus comprising an X-ray source, an illumination system for guiding said X-ray from said X-ray source to a mask, a projection system for guiding said X-ray to an exposed plane through said mask and projecting a pattern on said mask, wherein said projection system comprises a plurality of reflection mirrors, and at least one reflection mirror of the plurality of reflection mirrors is interchangeable with a reflection mirror having a surface shape different from said one reflection mirror.
Dependencies are inferred from the claim text.