Plasma display panel with insulating layer having specific characteristics
AssigneeFujitsu Limited
InventorsHiroyuki Nakahara, Takashi Katayama, Kazuhide Iwasaki, Manabu Ishimoto, Nobuhiro Iwase, Souichirou Hidaka, Akihiro Mochizuki
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Abstract
A plasma display panel of a matrix display type, having a first electrode and a second electrode which constitute a main electrode pair, the first electrode and the second electrode being covered with an insulating layer against a discharge gas, wherein the insulating layer comprises a magnesium oxide film formed at least as a surface layer thereof which is in contact with the discharge gas, the magnesium oxide film having an impedance in the range of 230 to 330 kΩ/cm2 at a frequency of 100 Hz.
Claims29
A plasma display panel having a first electrode and a second electrode which constitute a main electrode pair, the first electrode and the second electrode being covered with an insulating layer against a discharge gas, wherein the insulating layer comprises a magnesium oxide film formed at least as a surface layer thereof which is in contact with the discharge gas, the magnesium oxide film having an impedance in the range of 230 to 330 kΩ/cm2 at a frequency of 100 Hz.
A plasma display panel having a first electrode and a second electrode which constitute a main electrode pair, the first electrode and the second electrode being covered with an insulating layer against a discharge gas, wherein the insulating layer comprises a magnesium oxide film formed at least as a surface layer thereof which is in contact with the discharge gas, the magnesium oxide film containing silicon atom or a compound thereof at an amount of 500 to 10,000 weight ppm.
A plasma display device comprising:
- a plasma display panel having a first electrode and a second electrode which constitute a main electrode pair and are formed on a same plane, a third electrode being formed so as to intersect with the first electrode and the second electrode, the first electrode and the second electrode being covered with an insulating layer against a discharge gas, wherein the insulating layer comprises a magnesium oxide film formed at least as a surface layer thereof which is in contact with the discharge gas, the magnesium oxide film having an impedance in the range of 230 to 330 KΩ/cm2 at a frequency of 100 Hz, or containing silicon atom or a compound thereof at an amount of 500 to 10,000 weight ppm;
- and
- a drive apparatus for applying a reset voltage between the first electrode and the second electrode during an initializing time period, applying an address voltage between the second electrode and the third electrode during an address time period, and applying a sustain voltage between the first electrode and the second electrode during a sustain time period, whereby both an addressing operation and a sustain operation are performed after a charging distribution of the entire screen has been initialized by self-erasing discharge.
A substrate assembly for a plasma display panel, comprising:
- a substrate;
- a plurality surface-discharge electrodes on the substrate;
- a dielectric layer covering the surface-discharge electrodes;
- and
- an insulating layer covering the dielectric layer, wherein the insulating layer comprises a magnesium oxide film formed as a surface layer thereof on a side which is to be in contact with a discharge gas, the magnesium oxide film having an impedance in the range of 230 to 330 kΩ/cm2 at a frequency of 100 Hz.
A substrate assembly for a plasma display panel, comprising:
- a substrate;
- a plurality surface-discharge electrodes on the substrate;
- a dielectric layer covering the surface-discharge electrodes;
- and
- an insulating layer covering the dielectric layer, wherein the insulating layer comprises a magnesium oxide film formed as a surface layer thereof on a side which is to be in contact with a discharge gas, the magnesium oxide film containing silicon atom or a compound thereof at an amount of 500 to 10,000 weight ppm.
A method of manufacturing a plasma display panel having:
- a first electrode and a second electrode constituting a main electrode pair;
- and
- an insulating layer covering the first electrode and the second electrode so as to prevent the first and second electrodes from being in contact with a discharge gas,
- the insulating layer comprising a magnesium oxide film formed as a surface layer thereof on a side which is to be in contact with a discharge gas,
- wherein the magnesium oxide film is formed in such a manner that:
- magnesium oxide in a pellet form is mixed with a starting material of an impurity in a pellet or powder form, and the mixture is heated at the same time;
- a sintered member of a mixture of magnesium oxide in a powder form and a starting material of an impurity in a powder form is heated so as to be vapor-deposited;
- or
- a sintered member of a mixture of magnesium oxide in a powder form and a starting material of an impurity in a powder form is used as a target for sputtering,
- whereby the magnesium oxide film having an impedance in the range of 230 to 330 kΩ/cm2 at a frequency of 100 Hz is formed.
A method of manufacturing a plasma display panel having:
- a first electrode and a second electrode constituting a main electrode pair;
- and
- an insulating layer covering the first electrode and the second electrode so as to prevent the first and second electrodes from being in contact with a discharge gas,
- the insulating layer comprising a magnesium oxide film formed as a surface layer thereof on a side which is to be in contact with a discharge gas,
- wherein the magnesium oxide film is formed in such a manner that:
- magnesium oxide in a pellet form is mixed with a starting material of silicon or a compound thereof in a pellet or powder form, and the mixture is heated at the same time;
- a sintered member of a mixture of magnesium oxide in a powder form and a starting material of silicon or a compound thereof in a powder form is heated so as to be vapor-deposited;
- or
- a sintered member of a mixture of magnesium oxide in a powder form and a starting material of silicon or a compound thereof in a powder form is used as a target for sputtering,
- whereby the magnesium oxide film containing silicon atom or a compound thereof at an amount of 500 to 10,000 weight ppm is formed.
Dependencies are inferred from the claim text.