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AssigneeASM International N.V.
InventorsMargreet Obertine Anne-Marie Van Wijck, Rudi Wilhelm, Ernst Hendrik August Granneman
Estimating the term…
Method for the treatment of semiconductor substrates as well as an oven-boat system for this purpose. The oven is embodied as a vertical oven and it is aimed to simultaneously treat a number of substrates arranged one above the other in a boat. To carry out the deposition and such processes at raised temperatures an uniformly as possible, that is, so that each semiconductor substrate substantially undergoes the same treatment, it is proposed on the one hand to vary the ratio of the volume limited by two consecutive armrests and on the other hand the volume limited by screening off the process area and the edge of the substrates from the insertion end of the gas to the discharge end of the gas that flows through the oven.
An oven-boat system for the treatment of a number of semiconductor substrates arranged in an oven, wherein the oven is provided with an insertion end with an insertion opening which is provided with a lining tube for delimiting a treatment area and externally provided with heating elements and an insulating cover wherein means are provided for the insertion of a treatment gas from said insertion end and means for the removal of gas from a discharge and of the oven and wherein a boat comprises a number of mutually spaced supports, to carry the semiconductor substrates fitted to a frame of the boat such that said semiconductor substrates substantially extend in sequence, wherein the distance (pitch) between the consecutive supports changes from the insertion end of the treatment gas to the discharge end, in such a way that the distance between adjacent semiconductor substrates, when moving to the next position, increases by a substantially constant value.
An oven-boat system for the treatment of a number of semiconductor substrates arranged in a spaced array in an oven, wherein the oven is provided with an insertion end with an insertion aperture which is provided with a lining tube for delimiting a treatment area and externally provided with heating elements an insulating covering wherein means are present for the insertion of a treatment gas from said insertion end and means for the removal of gas from a discharge end of the oven and wherein a boat comprises a number of mutually spaced supports, to carry the semiconductor substrates fitted to a frame of the boat such that the semiconductor substrates substantially extend in sequence, wherein the planar area of the cross section of the lining tube changes from the insertion end of the treatment gas discharge end so that the distance from the lining tube to the edge of the semiconductor substrate 6 decreases from the insertion end of the treatment gas to the gas discharge end.
Dependencies are inferred from the claim text.