Removable cover for protecting a reticle, system including and method of using the same

A removable cover used to protect a reticle in a lithography system comprising:

• a frame with a plurality of sides surrounding an opening;
• and
• a plurality of flanges extending in a direction perpendicular to a plane corresponding to said opening such that when the removable cover is in place, the reticle is partially bounded at lateral edges by said plurality of flanges,
• wherein said removable cover protects the reticle during movement of the reticle between a shelf and a mount and is removable for lithographic exposure.

A lithographic system comprising:

• a reticle;
• a removable cover that protects said reticle when said reticle is not in use;
• a shelf that supports said reticle and said removable cover;
• a mount;
• and
• an end effector that transports said reticle with said removable cover in place from said shelf to said mount.

A method of performing lithography comprising the steps of:

• (a) positioning a reticle covered by a removable cover onto a mount;
• (b) removing said removable cover from said reticle;
• (c) performing lithographic exposure;
• and
• (d) replacing said removable cover on said reticle.