Apparatus for forming silicon oxide film and method of forming silicon oxide film
AssigneeSony Corporation
InventorsAkihide Kashiwagi, Toyotaka Kataoka, Toshihiko Suzuki
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Abstract
An apparatus for forming a silicon oxide film which has a process chamber and is for thermally oxidizing a surface of a silicon layer by introducing water vapor into the process chamber, and which further has dew-formation prevention/evaporation means for preventing dew formation in the process chamber and/or evaporating dew in the process chamber.
Claims21
A method of forming a silicon oxide film, which comprises the step of:
- thermally oxidizing a surface of a silicon layer of a substrate in a process chamber of an apparatus by introducing water into the process chamber;
- preventing dew formation in the process chamber, and evaporating any dew previously existing in the process chamber using a dew prevention/evaporation means;
- replacing an atmosphere in the process chamber with inert gas in a state where no water vapor is formed in the process chamber;
- and
- transferring the substrate out of the process chamber.
A method of forming a silicon oxide film, which comprises the steps of:
- transferring a substrate having a silicon layer into a process chamber;
- introducing water vapor into the process chamber to thermally oxidize a surface of the silicon layer;
- replacing an atmosphere in the process chamber with an inert gas atmosphere to remove the water vapor and/or dew out of the process chambers;
- and
- transferring the substrate out of the process chamber.
A method of forming a silicon oxide film using apparatus having a process chamber and drw-formation prevention/evaporation means, comprising the steps of:
- transferring a substrate having a silicon layer into the process chamber;
- introducing water vapor into the process chamber to thermally oxidize a surface of the silicon layer;
- thermally oxidizing the surface of the silicon layer in the process chamber;
- replacing an atmosphere in the process chamber with inert gas in a state such that no water vapor is formed in the process chamber;
- and all drw in the process chamber is evaporated;
- preventing drew formation in the process chamber;
- evaporating dew formation in the process chamber;
- removing water vapor out of the process chamber;
- and transferring the substrate out of the process chamber.
Dependencies are inferred from the claim text.