Alkane and polyamine solvent compositions for liquid delivery chemical vapor deposition
AssigneeAdvanced Technology Materials, Inc.
InventorsFrank S. Hintermaier, Thomas H. Baum
Life of this patent
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Abstract
A solvent composition for liquid delivery chemical vapor deposition of metal organic precursors, to form metal-containing films such as SrBi2Ta2O9 (SBT) films for memory devices. An SBT film may be formed using precursors such as Sr(thd)2(tetraglyme), Ta(OiPr)4(thd) and Bi(thd)3 which are dissolved in a solvent medium comprising one or more alkanes. Specific alkane solvent compositions may advantageously used for MOCVD of metal organic compound(s) such as β-diketonate compounds or complexes, compound(s) including alkoxide ligands, and compound(s) including alkyl and/or aryl groups at their outer (molecular) surface, or compound(s) including other ligand coordination species and specific metal constituents.
Claims19
A precursor composition for MOCVD of a metal-containing film on a substrate, wherein the precursor composition includes a solvent medium consisting essentially of (i) two or more alkanes, and optionally (ii) one or more Lewis base solvent components, said solvent medium having dissolved therein one or more compatible metal organic compound(s) selected from the group consisting of (i) β-diketonate compound(s), (ii) compound(s) including alkoxide ligands, and (iii) compound(s) including alkyl and/or aryl groups;
- and wherein each of said two or more alkanes is independently selected from the group consisting of C6-C12 alkanes.
A precursor composition for MOCVD of a metal-containing film on a substrate, wherein the precursor composition includes a solvent medium consisting essentially of (i) one or more alkanes, and optionally (ii) one or more Lewis base solvent components, said solvent medium having dissolved therein one or more compatible metal organic compound(s) selected from the group consisting of (i) β-diketonate compound(s), (ii) compound(s) including alkoxide ligands, and (iii) compound(s) including alkyl and/or aryl groups, wherein said metal organic compound(s) include one or more species of the group consisting of:
- Sr(thd)2(tetraglyme), Sr(thd)2(polyamine), Ba(thd)2(tetraglyme), Ba(thd)2(polyamine), Ta(OiPr)4(thd), Ti(OiPr)2(thd)2, Zr(OiPr)2(thd)2, Bi(thd)3, Pb(thd)2, Pb(thd)2(tmeda), Pb(thd)2(pmeda), Pt(thd)2, Pt(hfac)2, (methylcyclopentadienyl) Pt(Me)3, (MeCN)2PtMe2, Pd(allyl)2, Pd(hfac)2, Me2Au(hfac), MeAu(PMe3), Cu(hfac)2, (COD)Cu(hfac), (DMCOD)Cu(hfac), (MHY)Cu(hfac), (Me3P)CuOtBu, Ta(OR)5, and Ti(OR)4, wherein Me=methyl, COD=cyclooctadiene, thd=2,2,6,6-tetramethyl-3,5-heptanedionato, hfac=1,1,1,5,5,5-hexafluoro-2,4-pentanedionato, tBu=tert-butyl, and R=C1-C8 alkyl (branched or straight chain).
A precursor composition for MOCVD of a metal-containing film on a substrate, wherein said metal-containing film comprises at least one metal selected from the group consisting of bismuth, lead, zirconium, lithium, titanium, tantalum, and niobium, the precursor composition including a solvent medium comprising two or more alkanes having dissolved therein one or more compatible metal organic compound(s) selected from the group consisting of (i) β-diketonate compound(s), (ii) compound(s) including alkoxide ligands, and (iii) compound(s) including all and/or aryl groups.
Dependencies are inferred from the claim text.