Apparatus and method for exposing substrates

An apparatus for exposing a substrate to radiation comprising:

• a mask adapted to provide an exposure pattern;
• a frame adapted to hold the mask in a substantially vertical position;
• a platen adapted to receive the substrate in a substantially horizontal position;
• a chuck adapted to hold the substrate to the platen;
• a jack adapted to tilt the platen in order to place the substrate in a position substantially parallel to the mask;
• a light source to emit radiation through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• a shuttle adapted to move the light source in a linear path parallel to the mask thereby scanning the substrate with the light source across the linear path;
• and
• means for positioning the mask and substrate in close proximity to one another, wherein the means for positioning the mask and substrate comprises:
• a motor for moving the frame toward the platen;
• and
• a plurality of shims for spacing the mask and substrate from one another.

An apparatus for exposing a substrate to radiation comprising:

• a mask adapted to provide an exposure pattern;
• a frame adapted to hold the mask in a substantially vertical position;
• a platen adapted to receive the substrate in a substantially horizontal position;
• a chuck adapted to hold the substrate to the platen;
• a jack adapted to tilt the platen in order to place the substrate in a position substantially parallel to the mask;
• a light source to emit radiation through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• a shuttle adapted to move the light source in a linear path parallel to the mask;
• a plurality of horizontal rails upon which the shuttle is mounted in sliding engagement;
• and
• a motor adapted to slide the shuttle along the rails.

An apparatus for exposing a substrate to radiation comprising:

• a mask adapted to provide an exposure pattern;
• a frame adapted to hold the mask in a substantially vertical position;
• a platen adapted to receive the substrate in a substantially horizontal position;
• a chuck adapted to hold the substrate to the platen;
• a jack adapted to tilt the platen in order to place the substrate in a position substantially parallel to the mask;
• a light source emit radiation through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• a shuttle adapted to move the light source in a linear path parallel to the mask;
• a plurality of sensors for determining the alignment between a first plurality of targets on the mask and a second plurality of targets on the substrate;
• means for calculating a misalignment of the mask based on the determinations of the sensors and the desired alignment;
• and
• means for moving the mask to correct the misalignment.

An apparatus for exposing a substrate to radiation comprising:

• a frame adapted to hold a mask in a substantially vertical position;
• a platen adapted to hold the substrate in a substantially vertical position;
• a radiation source capable of producing a radiation beam through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• and
• a movable shuttle adapted to hold the radiation source while scanning the radiation beam along a linear path parallel to the substrate, thereby exposing the substrate with the radiation source in a single pass.

An apparatus for exposing substrate to radiation comprising:

• a frame adapted to hold a mask in a substantially vertical position:
• a platen adapted to hold the substrate in a substantially vertical position;
• a radiation source capable of producing a radiation beam through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• a movable shuttle adapted to hold the radiation source while moving the radiation bean along a linear path parallel to the substrate;
• a plurality of sensors for determining the alignment between a first plurality of targets on the mask and a second plurality of targets on die substrate;
• means for calculating a misalignment of the mask based on the determinations of the sensors and a desired alignment;
• and
• means for moving the mask to correct the misalignment.

A photolithography apparatus for exposing a photoresist-coated substrate to collimated light comprising:

• a frame adapted to hold a photolithographic mask in a substantially vertical position, the frame being positioned at an angle up to about 5 degrees from vertical;
• a tiltable platen adapted to move the substrate between a first substantially horizontal position and a second substantially vertical position;
• a jack adapted to tilt the substrate frame from the first position to the second position;
• a positioning mechanism adapted to position the mask and substrate in close proximity to one another;
• a collimated light source capable of producing a collimated light beam through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• and
• a movable shuttle adapted to hold the collimated light source while moving he collimated light beam along a linear path parallel to the substrate.

A photolithography apparatus for exposing a photoresist-coated substrate to collimated light comprising:

• a frame adapted to hold a photolithographic mask in a substantially vertical position;
• a tiltable platen adapted to move the substrate between a first substantially horizontal position and a second substantially vertical position;
• a jack adapted to tilt the substrate frame from the first position to the second position;
• a positioning mechanism adapted to position the mask and substrate in close proximity to one another;
• a collimated light source capable of producing a collimated light beam through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• a movable shuttle adapted to hold the collimated light source while moving he collimated light beam along a linear path parallel to the substrate;
• a plurality of sensors for determining an alignment between a first plurality of targets on the mask and a second plurality of targets on the substrate;
• means for calculating a misalignment of the mask based on the determinations of the sensors and the desired alignment;
• and
• means for moving the mask to correct the misalignment.

A photolithography apparatus for exposing a photoresist-coated substrate to collimated light comprising:

• a frame adapted to hold a photolithographic mask in a substantially vertical position;
• a tiltable platen adapted to move the substrate between a first substantially horizontal position and a second substantially vertical position;
• a jack adapted to tilt the substrate frame from the first position to the second position;
• a positioning mechanism adapted to position the mask and substrate in close proximity to one another;
• a collimated light source capable of producing a collimated light beam through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• and
• a movable shuttle adapted to hold the collimated light source while moving he collimated light beam along a linear path parallel to the substrate;
• whereby the frame and the tiltable platen are located in a first room and the collimated light source and the movable shuttle are located in a second room adjacent the first room.

An apparatus for exposing a substrate to radiation comprising:

• a frame adapted to hold a mask in a substantially vertical position;
• a platen adapted to hold the substrate in a substantially vertical position
• a radiation source capable of producing a radiation beam through the mask and onto the substrate in a direction substantially perpendicular to the substrate;
• a movable shuttle adapted to hold the radiation source while moving the radiation beam alone a linear path parallel to the substrate;
• a plurality of horizontal rails upon which the shuttle is mounted in sliding engagement;
• and
• a motor adapted to slide the shuttle along the rails.