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US 6,211,622 B1Granted
Plasma processing equipment
AssigneeKawasaki Jukogyo Kabushiki Kaisha
InventorsMakoto Ryoji, Takeshi Hasegawa, Masahito Ban, Yukitaka Mori
Life of this patent
Estimating the term…
Abstract
A plurality of extracting orifices 42 for extracting the electron beam from a discharge portion 2 into a plasma process chamber 3 via a compartment 4 are provided radially. A plurality of accelerating electrodes 36, 37 are arranged in the process chamber 3. The electron extracting direction from the extracting orifices 42 is set in substantially parallel with an object surface 35. The number and the arrangement of the accelerating electrodes 36, 37 are set such that a density distribution of the excited plasma has an oprimal state for processing the object. The object having a large area can be processed appropriately.
Claims37
A plasma processing equipment comprising:
- a discharge vessel in which a discharge chamber for generating a discharge plasma is formed;
- a vacuum vessel in which a process chamber for generating an excited plasma by exciting a process gas by virtue of electrons which are extracted from said discharge plasma is formed;
- a partition in which a compartment is formed, said compartment being communicated with said discharge chamber and protruding into said process chamber, said partition having a plurality of orifices for extracting said electrons from said discharge plasma toward said process chamber, said orifices being formed such that said electrons are emitted through said orifices along a direction parallel to a processed surface of an object which is to be processed by said excited plasma;
- and
- a plurality of accelerating electrodes arranged in said process chamber to extract said electrons through said orifices, wherein a number and an arrangement of said accelerating electrodes are set such that a density distribution of said excited plasma has an optimal state for processing said object.
2 more elements
A plasma processing equipment comprising:
- a discharge vessel in which a discharge chamber for generating a discharge plasma is formed;
- a vacuum vessel in which a process chamber for generating an excited plasma by exciting a process gas by virtue of electrons which are extracted from said discharge plasma is formed;
- a partition in which a compartment is formed, said copartment being communicated with said discharge chamber and protruding into said process chamber, said partition having a plurality of orifices for extracting said electrons from said discharge plasma toward said process chamber, said orifices being formed such that said electrons are emitted through said orifices along a direction parallel to a processed surface of an object which is to be processed by said excited plasma;
- accelerating electrodes arranged in said process chamber to extract said electrons through said orifices;
- and
- a magnetic field applying mechanism for applying a magnetic field to an inside of said process chamber to generate a magnetic field strength distribution which has a region, in which a strength of said magnetic field becomes minimal, on a flat plane which is parallel with said processed surface of said object and contains said orifices.
3 more elements
A plasma processing equipment comprising:
- a discharge vessel in which a discharge chamber for generating a discharge plasma is formed;
- a vacuum vessel in which a process chamber for generating an excited plasma by exciting a process gas by virtue of electrons which are extracted from said discharge plasma is formed;
- a partition in which a compartment is formed, said compartment being communicated with said discharge chamber and protruding into said process chamber, said partition having a plurality of orifices for extracting said electrons from said discharge plasma toward said process chamber, said orifices being formed such that said electrons are emitted through said orifices along a direction parallel to a processed surface of an object which is to be processed by said excited plasma;
- and
- accelerating electrodes arranged on a surface of said partition facing said process chamber to extract said electrons through said orifices.
2 more elements
A plasma processing equipment comprising:
- a discharge vessel in which a discharge chamber for generating a discharge plasma is formed;
- a vacuum vessel in which a process chamber for generating an excited plasma by exciting a process gas by virtue of electrons which are extracted from said discharge plasma is formed;
- a partition in which a compartment is formed, said compartment being communicated with said discharge chamber and protruding into said process chamber, said partition having a plurality of orifices for extracting said electrons from said discharge plasma toward said process chamber, said orifices being formed such that said electrons are emitted through said orifices along a direction parallel to a processed surface of an object which is to be processed by said excited plasma;
- and
- an accelerating electrode for extracting said electrons through said orifices, wherein said accelerating electrode has a gas supplying port for introducing said process gas into said process chamber.
2 more elements
A plasma processing equipment comprising:
- a discharge vessel in which a discharge chamber for generating a discharge plasma is formed;
- a vacuum vessel in which a process chamber for generating an excited plasma by exciting a process gas by virtue of electrons which are extracted from said discharge plasma is formed;
- a partition in which a compartment is formed as annular shape, said annular compartment being communicated with said discharge chamber and protruding into said process chamber, said partition having a plurality of orifices for extracting said electrons from said discharge plasma toward said process chamber, said orifices being formed such that said electrons are emitted through said orifices along a direction parallel to a processed surface of an object which is to be processed by said excited plasma;
- and
- an accelerating electrode formed as annular shape and arranged in said process chamber so as to surround said partition to extract said electrons through said orifices.
2 more elements
Dependencies are inferred from the claim text.