Apparatus and method of cleaning nozzle and apparatus of processing substrate
AssigneeTokyo Electron Limited
InventorsHiroyuki Sakai, Kazutaka Matsuo
Life of this patent
Estimating the term…
Abstract
An apparatus of cleaning a nozzle comprising a mounting table for mounting a substrate to be processed, a process liquid nozzle having a liquid output portion for outputting a process liquid toward the substrate mounted on the table, a nozzle cleaning mechanism having a fluid spray portion for spraying a cleaning fluid onto the liquid output portion of the process liquid nozzle to remove an attached material from the liquid output portion by the cleaning fluid sprayed from the fluid spray portion, and a nozzle moving mechanism for moving the process liquid nozzle between the mounting table and the nozzle cleaning mechanism.
Claims15
An apparatus for cleaning a nozzle comprising:
- a mounting table configured to mount a substrate to be processed;
- a linear nozzle having a liquid discharge portion having a plurality of openings extending along a line to discharge a process liquid toward the substrate mounted on the table;
- a box case having a bath chamber surrounding the liquid discharge portion when the linear nozzle is placed within said bath chamber, said bath chamber including a nozzle cleaning mechanism having a cleaning nozzle configured to spray a cleaning fluid onto the liquid discharge portion within the bath chamber so as to remove an attached material from the liquid discharge portion;
- and
- a linear nozzle moving mechanism configured to move the linear nozzle between the mounting table and the box case having the bath chamber including the nozzle cleaning mechanism.
An apparatus for processing a substrate comprising:
- a mounting table for mounting a substrate having a pattern-exposed photoresist film thereon;
- a developing nozzle having a liquid discharge portion configured to discharge a developing solution toward the photoresist film of the substrate on the mounting table;
- a box case having a bath chamber surrounding the liquid discharge portion when the developing nozzle is placed inside the bath chamber said bath chamber including a nozzle cleaning mechanism having a cleaning nozzle configured to spray cleaning fluid toward the liquid discharge portion within the bath chamber so as to remove an attached material from the liquid discharge portion;
- and
- a developing nozzle moving mechanism for moving the developing nozzle between the mounting table and the box case having the bath chamber including the nozzle cleaning mechanism.
Dependencies are inferred from the claim text.