Electrode substrate resistant to wire breakage for an active matrix display device

An electrode substrate comprising a signal line, wherein the signal line comprises:

• a first conductive layer having a narrowed wiring region, defining a boundary region, separating a first wiring pattern and a second wiring pattern of the first conductive layer;
• and
• a second conductive layer in electrical contact with the first conductive layer, the second conductive layer having a narrowed wiring region, defining another boundary region, separating a third wiring pattern and a fourth wiring pattern of the second conductive layer;
• wherein the boundary region of the first conductive layer and the boundary region of the second conductive layer do not overlap each other.

An electrode substrate comprising:

• a first conductive layer having a boundary region separating a first wiring pattern and a second wiring pattern of the first conductive layer;
• and
• a second conductive layer in electrical contact with the first conductive layer, the second conductive layer having an another boundary region separating a third wiring pattern and a fourth wiring pattern of the second conductive layer;
• wherein the boundary region of the first conductive layer and the boundary region of the second conductive layer do not overlap each other;
• and
• wherein the formation of said electrode substrate comprises:
• depositing a first conductive film;
• applying a first photoresist to said deposited first conductive film;
• exposing a first area of the applied first photoresist using a first mask pattern;
• exposing a second area of the applied first photoresist using a second mask pattern, wherein a part of the exposed second area of the applied first photoresist overlaps a part of the exposed first area of the applied first photoresist;
• developing said exposed first photoresist to form a first resist pattern;
• patterning said first conductive film in accordance with said first resist pattern to form a first conductive layer including a first wiring pattern, a second wiring pattern, and a boundary region;
• depositing a second conductive film;
• applying a second photoresist to said deposited second conductive film;
• exposing a third area of the applied second photoresist using a third mask pattern;
• exposing a fourth area of the applied second photoresist using a fourth mask pattern, wherein a part of the exposed fourth area of the applied second photoresist overlaps a part of the exposed third area of the applied second photoresist;
• developing said exposed second photoresist to form a second resist pattern;
• patterning said second conductive film in accordance with said second resist pattern to form a second conductive layer including a third wiring pattern, a fourth wiring pattern, and another boundary region.