Interlevel dielectric with air gaps to lessen capacitive coupling
AssigneeAdvanced Micro Devices, Inc.
InventorsBasab Bandyopadhyay, H. Jim Fulford, Jr., Robert Dawson, Fred N. Hause, Mark W. Michael, William S. Brennan
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Abstract
A reduced permittivity interlevel dielectric in a semiconductor device arranged between two levels of interconnect. The dielectric comprises a first dielectric layer preferably from a silane source deposited on a first level interconnect to form air gaps at midpoints between adjacent first interconnect structures, a second dielectric containing air gap trenches at spaced intervals across the second dielectric, and a third dielectric formed upon said second dielectric. A second interconnect level is formed on the third dielectric.
Claims21
An interlevel dielectric arranged between two levels of interconnect, comprising:
- a first dielectric configured upon and between a first set of conductors which comprise a first level of interconnect, wherein said first dielectric comprises voids disposed within said first dielectric between said first set of conductors;
- a plurality of trenches spaced from each other across a second dielectric which is configured upon said first dielectric;
- a third dielectric arranged over said trenches;
- and
- a second set of conductors which comprise a second level of interconnect formed upon said third dielectric.
An interlevel dielectric comprising:
- a first layer of dielectric material with voids disposed therein;
- a second layer of dielectric material with intermittent trenches placed therein, wherein said trenches extend partially between two levels of interconnect;
- and
- a contact formed between the two levels of interconnect a spaced distance from said trenches.
An interlevel dielectric comprising:
- a first layer of dielectric material with voids disposed therein;
- and
- a second layer of dielectric material with intermittent trenches placed therein, wherein said trenches extend partially between two levels of interconnect and wherein said trenches comprise air.
Dependencies are inferred from the claim text.