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AssigneeAlliedSignal Inc.
InventorsHui-Jung Wu, James S. Drage, Douglas M. Smith, Teresa Ramos, Stephen Wallace, Neil Viernes
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A process for treating silica dielectric film on a substrate, which includes reacting a suitable hydrophilic silica film with an effective amount of a multifunctional surface modification agent. The film is present on a substrate and optionally has a pore structure with hydrophilic pore surfaces, and the reaction is conducted for a period of time sufficient for said surface modification agent to penetrate said pore structure and produce a treated silica film having a dielectric constant of about 3 or less, wherein the surface modification agent is hydrophobic and suitable for silylating or capping silanol moieties on such hydrophilic surfaces. Dielectric films and integrated circuits including such films are also disclosed.
A hydrophobic dielectric film produced by a process comprising the steps of reacting a suitable hydrophilic silica film with an effective concentration of a surface modification agent, wherein said silica film is present on a substrate and wherein said reaction is conducted under suitable conditions and for a period of time sufficient for said surface modification agent to produce a treated silica film that is substantially hydrophobic, wherein said surface modification agent is multifunctional and wherein said surface modification agent is a compound having a formula selected from the group consisting of R1Si(NR2R3)3;
Dependencies are inferred from the claim text.