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US 6,207,959 B1Granted
Ion implanter
AssigneeApplied Materials, Inc.
InventorsShu Satoh, Theodore H. Smick
Life of this patent
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AssigneeApplied Materials, Inc.
InventorsShu Satoh, Theodore H. Smick
Estimating the term…
An ion implanter for sequentially processing single semiconductor wafers includes a scanning arm extending along a first axis. A wafer holder is mounted on a free end of the arm so as to be rotatable about a second axis centered on and perpendicular to the plane of the wafer. The wafer can be scanned through an ion beam by reciprocating the arm transversely of the first axis. A rotary motor is mounted in the scanning arm near the free end with its axis of rotation parallel to the first axis and perpendicular to the second axis. A right angle rotary drive connects the motor to the wafer holder. A hard stop is provided on the motor to prevent the wafer from being rotated by more than 360°. Connections to the wafer on the holder are provided by a flexible circuit coiled about the second axis. The scanning mechanism can itself be rotated about an axis parallel to the arm so as to tilt the scanning direction, the wafer holder is itself further rotatable about the arm axis relative to the scanning mechanism. This enables the wafer to be rotated to the horizontal when the mechanical scanning mechanism holds the arm with the wafer above the beam.
An ion implanter for sequentially processing single semiconductor wafers comprising:
An ion implanter for sequentially processing single semiconductor wafers comprising a wafer holder mounted for rotation about an axis centred on and perpendicular to the plane of a wafer on the wafer holder, a rotary motor, and a drive mechanism connecting the motor to the wafer holder to control rotation thereof about said axis, said drive mechanism providing a reduction ratio R:1, where R>1, between the motor and the wafer holder, and a hard stop limiting rotation of the motor to a range of substantially R turns, such as to limit rotation of the wafer holder to a maximum of just over 360°.
An ion implanter for sequentially processing single semiconductor wafers comprising a wafer holder including electrical components and mounted for rotation about an axis centred on and perpendicular to the plane of a wafer on the wafer holder, a motor, a drive mechanism connecting the motor to the wafer holder for controlling rotation thereof about said axis, and a flexible conductor element to provide electrical connections to the electrical components of the wafer holder, said flexible conductor element being coiled about said axis to accommodate rotation of said wafer holder by coiling and uncoiling.
An ion implanter for sequentially processing single semiconductor wafers, comprising a scanning arm extending along a generally horizontal axis between an outer end and an inner end,
Dependencies are inferred from the claim text.