Antireflective coating for microlithography
AssigneeInternational Business Machines Corporation
InventorsJames Thomas Fahey, Brian Wayne Herbst, Leo Lawrence Linehan, Wayne Martin Moreau, Gary Thomas Spinillo, Kevin Michael Welsh, Robert Lavin Wood
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Abstract
A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
Claims7
A compound having the formula
- where m, n, and o reflect the relative percentages of monomer constituents in the compound, and where m ranges from 1-49%, n ranges from 1-50%, and o ranges from 1-20%.
A co-polymer having the formula:
- where m, n, and o reflect the relative percentages of benzophenone, bisphenol A, and anthracene monomer constituents, respectively, in the co-polymer, and where a positive percentage of each of the benzophenone, bisphenol A, and anthracene monomer constituents are present in the co-polymer.
Dependencies are inferred from the claim text.