Method of manufacturing thin film magnetic head

Abstract

A thin film magnetic film having a bottom yoke, a top yoke, a thin film coil having a part sandwiched between the bottom yoke and the top yoke, a coil insulating film to support the thin film coil in insulation, a write gap film intervened at least between the pole portions of the top and the bottom yokes opposing to a magnetic recording medium and a substrate to support the bottom yoke, the top yoke, the thin film coil, the coil insulating film and the write gap film in which the coil insulating film has an inclined part rising up from the rear ends of the pole portions and the top yoke has a part rising up alongside the inclined part of the coil insulating film is manufacturing by the following steps: After the bottom yoke, the write gap film, the thin film coil and the coil insulating film are formed, an antireflection film is formed on the whole surface of the coil insulating film and the exposing surface of the write gap film. Then, the part of the antireflection film formed on an area corresponding to the pole portions on the exposing surface of the write gap film is selectively removed, and a photoresist is formed so as to cover the antireflection film, the coil insulating film and an area of the write gap film corresponding to the pole portions. A resist frame having an opening with a desired pattern is formed precisely by photolithography for the photoresist with a reflectance of a light at the coil insulating film being controlled, and thereafter, the part of the antireflection film in the opening of the resist frame is removed. Then, the top yoke is formed in the opening of the resist frame is formed, and thereafter, the resist frame and the remaining antireflection film is removed.

Dependencies are inferred from the claim text.