Positive photosensitive composition
AssigneeFuji Photo Film Co., Ltd.
InventorsToru Fujimori, Shiro Tan
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AssigneeFuji Photo Film Co., Ltd.
InventorsToru Fujimori, Shiro Tan
Estimating the term…
The present invention provides a positive photosensitive composition comprising a compound having a group represented by the following general formula (Ia) or (Ib) which decomposes by the action of an acid to enhance its solubility in an alkaline developing solution and a compound which generates an acid upon irradiation with actinic rays or radiation: wherein R1a and R2a each represent a hydrogen atom or a C1-4 alkyl group; Wa represents a single bond or a divalent organic group; R3a represents a group which decomposes the action of an acid; R1b and R2b each represent a hydrogen atom or a C1-4 alkyl group; Wb represents a divalent organic group; and R3b represents a C11-20 chain alkyl group which may have substituents, a C11-20 cyclic alkyl group which may have substituents, a C11-30 aryl group which may have substituents or a C12-30 aralkyl group which may have substituents.
A positive photosensitive composition, comprising:
A positive photosensitive composition, comprising:
Dependencies are inferred from the claim text.