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US 6,207,269 B1Granted
High substrate bias sputtering underlayer for longitudinal recording media
AssigneeSeagate Technology LLC
InventorsZhong Stella Wu, Rajiv Yadav Ranjan
Life of this patent
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Abstract
High substrate biasing during sputter deposition of an underlayer enables the manufacture of a magnetic recording medium exhibiting increased Hr, S* and SNR. Embodiments include sputter depositing a CrMn underlayer on a NiP-plated Al substrate at a negative substrate bias greater than about 300 volts and subsequently depositing a CoCrPtTa magnetic layer.
Claims13
A magnetic recording medium comprising:
- an on-magnetic substrate;
- a chromium manganese (CrMn) underlayer on the substrate;
- and
- a magnetic layer, comprising an alloy of cobalt-chromium-platinum-tantalum, on the underlayer, wherein the magnetic layer has a (11{overscore (2)}0)-dominant crystallographic orientation, the CrMn underlayer has a (200)-dominant crystallographic orientation and the magnetic recording medium has a:
- Hr greater than about 3000 Oersteds;
- S* greater than about 0.85;
- and
- SNR greater than about 24 dB @240 kfci.
5 more elements
A method of manufacturing a magnetic recording medium, the method comprising:
- sputter depositing a chromium manganese (CrMn) underlayer on a non-magnetic substrate while applying a negative substrate bias greater than about 300 volts;
- and
- depositing a magnetic layer, containing a cobalt-chromium-platinum-tantalum alloy, on the underlayer, wherein the magnetic layer has a (11{overscore (2)}0)-dominant crystallographic orientation, the CrMn underlayer has a (200)-dominant crystallographic orientation and the magnetic recording medium has a:
- Hr greater than about 3000 Oersteds;
- S* greater than about 0.85;
- and
- SNR greater than about 24 dB @240 kfci.
4 more elements
Dependencies are inferred from the claim text.