Coating film forming method and coating apparatus
AssigneeTokyo Electron Limited
InventorKiyohisa Tateyama
Life of this patent
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Abstract
In forming a resist film by supplying a resist liquid onto a surface of an LCD substrate loaded in a rotation cup, a coating liquid is coated on the surface of the substrate by spraying the resist liquid onto the surface thereof while not rotating the substrate to thus form the coating film on the overall surface of the substrate, then the substrate is sealed into the rotation cup by closing the processing vessel by a lid member, and then a film thickness of the coating film is regulated by rotating the rotation cup and the substrate.
Claims26
A coating film forming method for forming a coating film by supplying a coating liquid onto a surface of a substrate which is loaded in a processing vessel, comprising the steps of:
- (a) coating the coating liquid on the surface of the substrate by spraying the coating liquid from nozzle means onto the surface thereof and allowing said nozzle means to scan along the surface of the substrate while not rotating the substrate, to thus form the coating film;
- (b) sealing the substrate into the processing vessel by closing the processing vessel by means of a lid member after the step (a);
- and
- (c) regulating a film thickness of the coating film while rotating the substrate together with the processing vessel.
A coating film forming method for forming a coating film by supplying a coating liquid onto a surface of a substrate which is loaded in a processing vessel, comprising the steps of:
- (A) coating the coating liquid on the surface of the substrate by spraying the coating liquid from nozzle means onto the surface thereof and allowing said nozzle means to scan along the surface of the substrate while not rotating the substrate;
- (B) forming the coating film by spreading the coating liquid over the surface of the substrate while rotating the substrate at a first revolution speed;
- (C) sealing the substrate into the processing vessel by closing the processing vessel by means of a lid member after the step (B);
- and
- (D) regulating a film thickness of the coating film while rotating the substrate which is sealed in the processing vessel, at a second revolution speed which is higher than the first revolution speed.
A coating film forming method for forming a coating film by supplying a coating liquid onto a surface of a substrate which is loaded in a processing vessel, comprising the steps of:
- (1) coating a solvent on the surface of the substrate;
- (2) coating the coating liquid on the surface of the substrate by spraying the coating liquid from nozzle means onto the surface thereof and allowing said nozzle means to scan along the surface of the substrate, to thus form the coating film;
- (3) sealing the substrate into the processing vessel by closing the processing vessel by use of a lid member after the step (2);
- and
- (4) regulating a film thickness of the coating film by rotating the substrate.
A coating film forming method for forming a coating film by supplying a coating liquid onto a surface of a substrate which is loaded in a processing vessel, comprising the steps of:
- (I) coating a solvent on the surface of the substrate;
- (II) coating the coating liquid onto the surface of the substrate by spraying the coating liquid from nozzle means onto the surface of the substrate and allowing said nozzle means to scan along the surface of the substrate;
- (III) forming the coating film by spreading the coating liquid on the surface of the substrate while rotating the substrate at a first revolution speed;
- (IV) sealing the substrate into the processing vessel by closing the processing vessel by use of a lid member after the step (III);
- and
- (V) regulating a film thickness of the coating film by rotating the substrate which is sealed in the processing vessel, at a second revolution speed which is higher than the first revolution speed.
A coating apparatus for forming a coating film by supplying a coating liquid onto a surface of a substrate which is loaded in a processing vessel, comprising;
- a processing vessel formed like a cup shape with an opening portion so as to surround the substrate;
- a vessel rotating means for rotating the processing vessel together with the substrate;
- a lid member for closing an opening portion of the processing vessel;
- a supporting means for supporting the substrate in a state where the surface of the substrate is kept horizontally;
- a substrate rotating means rotating the substrate by rotating the supporting means;
- a coating liquid spraying means for spraying the coating liquid onto the surface of the substrate;
- and
- a scanning means for scanning the coating liquid spraying means along the surface of the substrate.
A coating apparatus for forming a coating film by supplying a coating liquid onto a surface of a substrate which is loaded in a processing vessel, comprising:
- a processing vessel formed to have a cup shape with an opening portion so as to surround the substrate;
- a lid member for closing an opening portion of the processing vessel;
- a supporting means for supporting the substrate in a state where the surface of the substrate is kept horizontally;
- a substrate rotating means for rotating the substrate by rotating the supporting means;
- a coating liquid spraying means for spraying the coating liquid onto the surface of the substrate;
- a coating liquid cover having an exhaust portion, for covering the coating liquid spraying means;
- a solvent supplying means for supplying a solvent for the coating liquid onto the surface of the substrate;
- and
- a scanning means for scanning the coating liquid spraying means along the surface of the substrate.
A coating apparatus for forming a coating film by supplying a coating liquid onto a surface of a substrate which is loaded in a processing vessel, comprising:
- a processing vessel formed to have a cup shape with an opening portion so as to surround the substrate;
- a supporting means for supporting the substrate in a state where the surface of the substrate is kept horizontally;
- a substrate rotating means for rotating the substrate by rotating the supporting means;
- a coating liquid spray means for spraying the coating liquid onto the surface of the substrate;
- a solvent supplying means for spraying a solvent for the coating liquid onto the surface of the substrate;
- and
- a solvent cover for covering the solvent supplying means.
Dependencies are inferred from the claim text.