Apparatus for vapor deposition and evaporator

Apparatus for plasma assisted physical vapor deposition of coatings onto workpieces comprising at least one or more cathode spot arc evaporators, the apparatus comprising a main chamber having a wall and a parallelepiped side chamber, the wall of the main chamber having at least one rectangular opening, the at least one rectangular opening of the main chamber being connected to the parallelepiped side chamber along a side of the parallelepiped side chamber by a port, the workpieces being contained exclusively in the main chamber, the main chamber containing no cathode spot arc evaporators and all the evaporators being mounted in the parallelepiped side chamber, the length of the rectangular opening corresponding to at least 60% of height of the main chamber, the depth of the side chamber being a range of 300 to 800 mm, and the at least one rectangular opening of the main chamber corresponding to a cylinder jacket to an angle of aperture α larger than π/10 but smaller than π/3.