Integrated temperature controlled exhaust and cold trap assembly

An exhaust assembly for a semiconductor wafer processing system, comprising:

• a unitary valve body;
• a multi-stage trap assembly connected to said unitary valve body having at least one isolating valve located between said unitary valve body and'said trap assembly, a housing having a first opening and a second opening, a multi-stage cold trap and a particle trap;
• said multi-stage cold trap further comprises a plurality of baffle plates cooled to a predetermined temperature, said plurality of baffle plates defining a plurality of compartments inside said housing;
• wherein
• said first housing opening provides an entrance to a first compartment;
• said second housing opening provides an exit out of a second compartment;
• and
• each one of said remaining compartments is connected to at least two adjacent compartments by apertures defined in two baffle plates.