Plasma source with multiple magnetic flux sources each having a ferromagnetic core
AssigneeApplied Komatsu Technology, Inc.
InventorAlbert R. Ellingboe
Life of this patent
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AssigneeApplied Komatsu Technology, Inc.
InventorAlbert R. Ellingboe
Estimating the term…
Apparatus and methods for producing a plasma in a plasma chamber are described. One embodiment includes two or more sources of magnetic flux, each of which defines a single magnetic pole adjacent to a plasma chamber window. Each magnetic flux source is laterally spaced apart from any other magnetic flux source so that, during operation of the plasma source, plasma generation in regions of the plasma chamber immediately adjacent to the magnetic flux sources is substantially greater than plasma generation in regions of the plasma chamber located between the two or more sources. Another embodiment includes an antenna positioned adjacent to the plasma chamber window, and a ferromagnetic core positioned adjacent to the antenna. The ferromagnetic core is configured to concentrate magnetic flux in the vicinity of the antenna through the plasma chamber window and into the plasma chamber. The antenna and the ferromagnetic core are cooperatively configured to induce in the plasma chamber plasma currents that flow in planes that are substantially parallel to the plasma chamber window.
A plasma source comprising:
A method of exciting a plasma in a plasma chamber containing a gas and having a window transmissive of magnetic flux, comprising;
A method of exciting a plasma in a plasma chamber containing a gas and having a window transmissive of magnetic flux, comprising;
A plasma source comprising:
A plasma source comprising:
Dependencies are inferred from the claim text.