Electron beam image picturing method and image picturing device

An electron beam drawing method comprising the steps of:

• obtaining an optimal irradiation amount of an electron beam in accordance with a drawing area ratio at each of drawing positions, prior to drawing a desired pattern by irradiating an electron beam on a sample;
• separating said optimal irradiation amount obtained in a plurality of gradations as a correction amount for a reference irradiation amount of the electron beam, said separation being made in a plurality of gradations between a maximum value of said correction amount and a minimum value of said correction amount, and determining a representative correction amount data for each of said plurality of gradations;
• storing said representative correction amount data determined for each of said plurality of gradations;
• and
• drawing a pattern on a sample with the optical irradiation amount corresponding to read data of said representative correction amount stored.

An electron beam drawing device comprising:

• means for obtaining an optimal irradiation amount of an electron beam in accordance with a drawing area ratio at each of drawing positions, prior to drawing a desired pattern by irradiating an electron beam on a sample;
• means for separating said optimal irradiation amount obtained in a plurality of gradations as a correction amount for a reference irradiation amount of the electron beam, said separation being made finer as the drawing area ratio is higher, and determining a representative correction amount data for each of said plurality of gradations;
• means for storing said representative correction amount data determined for each of said plurality of gradations;
• and
• means for drawing a pattern on a sample with the optical irradiation amount corresponding to read data of said representative correction amount stored.

An electron beam drawing device comprising:

• means for obtaining an optimal irradiation amount of an electron beam in accordance with a drawing area ratio at each of drawing positions, prior to drawing a desired pattern by irradiating an electron beam on a sample;
• means for separating said optimal irradiation amount obtained in a plurality of gradations as a correction amount for a reference irradiation amount of the electron beam, said separation being made in a plurality of gradations between a maximum value of said correction amount and a minimum value of said correction amount, and determining a representative correction amount data for each of said plurality of gradations;
• means for storing said representative correction amount data determined for each of said plurality of gradations;
• and
• means for drawing a pattern on a sample with the optical irradiation amount corresponding to read data of said representative correction amount stored.