Back to results
US 6,204,206 B1Granted
Silicon nitride deposition method
AssigneeMicron Technology, Inc.
InventorKelly T. Hurley
Life of this patent
Estimating the term…
Abstract
A silicon nitride deposition method includes providing a substrate surface including one or more component surfaces. At least a monolayer of silicon is predeposited on the one or more component surfaces resulting in a substantially native oxide free uniform predeposited silicon substrate surface. A silicon nitride layer is then deposited on the predeposited silicon substrate surface after the silicon predeposition.
Claims12
A silicon nitride deposition method comprising the steps of:
- providing a substrate surface including one or more component surfaces;
- predepositing at least a monolayer of silicon on the one or more component surfaces of the substrate surface resulting in a substantially native oxide free uniform predeposited silicon substrate surface;
- and
- depositing a silicon nitride layer on the predeposited silicon substrate surface after the silicon predeposition.
1 more element
Dependencies are inferred from the claim text.