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US 6,204,190 B1Granted
Method for producing an electronic device
AssigneeMurata Manufacturing Co., Ltd.
InventorYoshihiro Koshido
Life of this patent
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Abstract
A method for producing an electronic device, comprises the steps of: depositing a thin film on a substrate; etching a portion of the thin film by a reactive ion etching so as to leave a remaining portion of the thin film behind; and removing the remaining thin film by a physical etching using an inert gas.
Claims16
A method for producing an electronic device, comprising the steps of:
- depositing a thin film on a substrate;
- etching a portion of the thin film by a reactive ion etching so as to leave a portion of the thin film on the substrate;
- and
- removing the remaining thin film by inert gas physical etching.
1 more element
Dependencies are inferred from the claim text.