Method for manufacturing semiconductor components having micromechanical structures
AssigneeRobert Bosch GmbH
InventorsJoerg Muchow, Helmut Baumann
Life of this patent
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Abstract
A method for manufacturing semiconductor components having micromechanical structures, micromechanical structures being patterned in a wafer for detecting a physical quantity acting on micromechanical structures, and semiconductor components for converting the physical quantity into an electrical signal proportional to the physical quantity being produced. The semiconductor components and the micromechanical structures are defined in a self-aligning manner by process steps acting on one side of the wafer to produce semiconductor components.
Claims2
A method for manufacturing a semiconductor device, the semiconductor device including a deformable membrane and at least one piezoresistor, the at least one piezoresistor providing a measure of a deformation of the deformable membrane, the method comprising the steps of:
- applying a masking layer to a silicon layer of a substrate;
- forming at least one opening having at least one edge by patterning the masking layer;
- introducing dopants for forming the at least one piezoresistor through the at least one opening into the silicon layer;
- controlling the forming of the at least one piezoresistor in at least one direction via the at least one edge of the at least one opening;
- joining the masking layer to a plate, the plate, before joining, being separate from the substrate;
- forming the deformable membrane by at least removing at least a portion of the substrate;
- and
- defining at least one edge of the deformable membrane by the at least one edge of the at least one opening.
A method for manufacturing a pressure sensor, the pressure sensor including a deformable membrane and at least one piezoresistor, the at least one piezoresistor providing a measure of a deformation of the deformable membrane, the method comprising the steps of:
- applying a masking layer to a silicon layer of a substrate;
- forming at least one opening having at least one edge by patterning the masking layer;
- introducing dopants for forming the at least one piezoresistor through the at least one opening into the silicon layer;
- controlling the forming of the at least one piezoresistor in at least one direction via the at least one edge of the at least one opening;
- joining the masking layer to a plate, the plate, before joining, being separate from the substrate;
- forming the deformable membrane by at least removing at least a portion of the substrate;
- and
- defining at least one edge of the deformable membrane by the at least one edge of the at least one opening.
Dependencies are inferred from the claim text.