US 6,203,965 B1 · Photoresist comprising blends of photoacid generators

Abstract

The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size. A specific composition comprises a terpolymer having units of hydroxystyrene, styrene and t-butyl acrylate with the photoacid generators di-(4-tbutylphenyl)iodonium camphorsulfonate and di-(4-t-butylphenyl)iodonium o-trifluoromethylbenzene sulfonate.

Claims4

Dependent claims

A photoresist composition comprising:

1) a terpolymer resin having polymerized units of hydroxystyrene, styrene and tert-butyl acrylate;
and
2) a mixture of photoacid generator compounds consisting of i) di-(4-t-butylphenyl)iodonium camphorsulfonate and ii) di-4-t-butylphenyl)iodonium o-trifluoromethylbenzene sulfonate, the mixture present in an amount sufficient to permit development of an exposed coating layer of the composition.

Dependencies are inferred from the claim text.

Facts

Application

09/552,211Filed 19 Apr 2000 · continuation

Priority

20 Feb 1999

Granted

20 Mar 2001

Term ends

Not estimatedThe source records don’t support an estimate.

Classification6 codes

G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Y10S 430/114
Radiation sensitive composition or product or process of making: initiator containing
Y10S 430/115
Initiator containing: cationic or anionic
Y10S 430/122
Initiator containing: sulfur compound containing

Photoresist comprising blends of photoacid generators

Life of this patent

Photoresist comprising blends of photoacid generators

Life of this patent

Abstract

Claims4